People Background Check
Find People:

Richard R Wise, Age 80Dutch Flat, CA

Get Report
Known as:
Adele R Wise Adele Raimondi Wise Richard Robert Wise Dick R Wise Adelle R Wise Rick R Wise
Related to:
Mindy Lea Wise 63

Richard Wise Phones & Addresses

Dutch Flat, CA

8130 Woodman Ln, Newcastle, CA 95658 (530) 823-0172

Auburn, CA

Burlingame, CA

Oakland, CA

Mentions for Richard R Wise

Career records & work history

Lawyers & Attorneys

Richard Wise Photo 1

Richard Wise - Lawyer

Specialties:
Creditors Rights, Real Property Tax Liens, Litigation, Bankruptcy & Debt, Civil Rights, Elder Law, Election Campaigns & Political Law, Commercial
ISLN:
902678321
Admitted:
1970
University:
San Diego State College, B.A., 1965
Law School:
University of California at Los Angeles, J.D., 1968
Richard Wise Photo 2

Richard Wise - Lawyer

ISLN:
902678307
Admitted:
1966
University:
University of Colorado at Boulder, B.A.
Law School:
University of Colorado at Boulder, J.D.
Richard Wise Photo 3

Richard Wise - Lawyer

ISLN:
902678284
Admitted:
1983
University:
University of Rochester, B.A., 1977; University of Rochester, M.B.A., 1978
Law School:
Washington University, J.D., 1983
Richard Wise Photo 4

Richard Wise - Lawyer

Office:
Richard A. Wise
ISLN:
914537616
Admitted:
1985
University:
Columbia University, B.A., 1978
Law School:
Benjamin N. Cardozo School of Law, J.D., 1984
Richard Wise Photo 5

Richard Wise - Lawyer

Office:
Law Office of Richard H. Wise
Specialties:
Trusts and Estates, Trusts & Estates, Estate Planning, Litigation, Real Property Law
ISLN:
902678314
Admitted:
1967
University:
Princeton University, A.B., 1959; University of California, Berkeley, M.A., 1963
Law School:
Hastings College of Law, University of California, J.D., 1966
Richard Wise Photo 6

Richard Hungerford Wise Jr, San Francisco CA - Lawyer

Address:
601 California St, San Francisco, CA 94108
Phone:
(415) 421-6200 (Phone), (415) 296-8422 (Fax)
Experience:
57 years
Specialties:
Business Law, Estate Planning
Jurisdiction:
California (1967)
Law School:
UC Hastings COL
Education:
Princeton Univ, Undergraduate Degree
UC Hastings COL, Law Degree
Memberships:
California State Bar (1967)

Medicine Doctors

Richard Wise Photo 7

Dr. Richard W Wise, Alameda CA - MD (Doctor of Medicine)

Specialties:
Internal Medicine
Address:
1777 Shoreline Dr Suite 318, Alameda, CA 94501
2417 Central Ave, Alameda, CA 94501
(510) 752-1190 (Phone)
2419 Sw Richardson St, Portland, OR 97239
(503) 245-3494 (Phone)
Certifications:
Internal Medicine, 1982
Awards:
Healthgrades Honor Roll
Languages:
English
Hospitals:
1777 Shoreline Dr Suite 318, Alameda, CA 94501
2419 Sw Richardson St, Portland, OR 97239
2417 Central Ave, Alameda, CA 94501
Kaiser Sunnyside Medical Center
10180 South East Sunnyside Road, Clackamas, OR 97015
Salem Hospital
890 Oak Street South East, Salem, OR 97301
Education:
Medical School
University Of Minnesota Medical School
Graduated: 1979
Medical School
Or Health Science University Hospital
Graduated: 1979

Richard G. Wise

Specialties:
Family Medicine
Work:
Richard G Wise DO
11 Sycamore Dr, New Middletown, OH 44442
(330) 542-2881 (phone) (330) 542-0074 (fax)
Education:
Medical School
Ohio University College of Osteopathic Medicine
Graduated: 1983
Procedures:
Allergen Immunotherapy, Destruction of Benign/Premalignant Skin Lesions, Electrocardiogram (EKG or ECG), Osteopathic Manipulative Treatment, Psychological and Neuropsychological Tests, Vaccine Administration
Conditions:
Abnormal Vaginal Bleeding, Acute Bronchitis, Acute Conjunctivitis, Acute Pharyngitis, Acute Sinusitis, Allergic Rhinitis, Carpel Tunnel Syndrome, Contact Dermatitis, Diverticulitis, Fractures, Dislocations, Derangement, and Sprains, Gastrointestinal Hemorrhage, Hemorrhoids, Herpes Zoster, Hypothyroidism, Intervertebral Disc Degeneration, Non-Toxic Goiter, Otitis Media, Phlebitis and Thrombophlebitis, Prostatitis, Sciatica, Skin and Subcutaneous Infections, Abdominal Hernia, Acne, Acute Upper Respiratory Tract Infections, Alopecia Areata, Alzheimer's Disease, Anal Fissure, Anemia, Anxiety Dissociative and Somatoform Disorders, Anxiety Phobic Disorders, Atrial Fibrillation and Atrial Flutter, Attention Deficit Disorder (ADD), Autism, Bacterial Pneumonia, Bell's Palsy, Benign Prostatic Hypertrophy, Breast Disorders, Bronchial Asthma, Burns, Calculus of the Urinary System, Candidiasis, Cardiac Arrhythmia, Chickenpox, Cholelethiasis or Cholecystitis, Chronic Sinusitis, Cirrhosis, Croup, Dermatitis, Diabetes Mellitus (DM), Disorders of Lipoid Metabolism, Diverticulosis, Erectile Dysfunction (ED), Gastritis and Duodenitis, Gastroesophageal Reflux Disease (GERD), Gout, Hearing Loss, Heart Failure, Herpes Simplex, Hypertension (HTN), Hyperthyroidism, Hypoparathyroidism, Infectious Mononucleosis, Inguinal Hernia, Internal Derangement of Knee, Intracranial Injury, Iron Deficiency Anemia, Irritable Bowel Syndrome (IBS), Ischemic Bowel Disease, Labyrinthitis, Lateral Epicondylitis, Lyme Disease, Malignant Neoplasm of Female Breast, Menopausal and Postmenopausal Disorders, Migraine Headache, Multiple Sclerosis (MS), Orbital Infection, Osteoarthritis, Osteoporosis, Parkinson's Disease, Paroxysmal Supreventricular Tachycardia (PSVT), Peripheral Nerve Disorders, Plantar Fascitis, Plantar Warts, Psoriasis, Pulmonary Embolism, Rheumatoid Arthritis, Rosacea, Substance Abuse and/or Dependency, Tempromandibular Joint Disorders (TMJ), Thyroid Cancer, Thyroiditis, Tinea Pedis, Transient Cerebral Ischemia, Urinary Tract Infection (UT), Varicose Veins, Venous Embolism and Thrombosis, Vitamin D Deficiency
Languages:
English
Description:
Dr. Wise graduated from the Ohio University College of Osteopathic Medicine in 1983. He works in New Middletown, OH and specializes in Family Medicine. Dr. Wise is affiliated with Salem Regional Medical Center and St Elizabeth Health Center.

Richard B. Wise

Specialties:
Ophthalmology, Ophthalmology/pediatrics
Work:
Wise Family Eye Center
54 W Jimmie Leeds Rd STE 15, Absecon, NJ 08205
(609) 652-1010 (phone) (609) 652-7759 (fax)
Jersey Shore GastroenterologyAtlanticare Surgery Center
2500 English Crk Ave STE 702, Egg Harbor Township, NJ 08234
(609) 407-2200 (phone) (609) 407-2392 (fax)
Site
Education:
Medical School
Univ of Toronto, Fac of Med, Toronto, Ont, Canada
Graduated: 1996
Procedures:
Eye Muscle Surgery, Lens and Cataract Procedures, Ophthalmological Exam
Conditions:
Acute Conjunctivitis, Cataract, Diabetic Retinopathy, Glaucoma, Keratitis, Macular Degeneration, Orbital Infection, Primary Angle-Closure Glaucoma, Retinal Detachments
Languages:
English, German, Tagalog
Description:
Dr. Wise graduated from the Univ of Toronto, Fac of Med, Toronto, Ont, Canada in 1996. He works in Egg Harbor Township, NJ and 1 other location and specializes in Ophthalmology and Ophthalmology/pediatrics. Dr. Wise is affiliated with Atlanticare Regional Medical Center, Atlanticare Regional Medical Center and Shore Medical Center.
Richard Wise Photo 8

Richard William Wise

Specialties:
Internal Medicine
Cardiology
Education:
University of Minnesota, Twin Cities (1979)
Richard Wise Photo 9

Richard Clarke Wise

Specialties:
Family Medicine
Geriatric Medicine
Pain Medicine
Pain Medicine
Education:
University of Colorado (1973)
Richard Wise Photo 10

Richard Bryan Wise

Specialties:
Ophthalmology
Pediatric Ophthalmology
Education:
University Of Toronto Faculty Of Medicine (1996)

License Records

Richard Bryan Wise

Licenses:
License #: MT038511T - Expired
Category: Medicine
Type: Graduate Medical Trainee

Resumes & CV records

Resumes

Richard Wise Photo 64

In Progress

Position:
Owner/Operator at Magic Moments, Tinter at Kelly-Moore Paints, Customer Service Representative, Assistant Manager at KELLY-MOORE PAINT COMPANY
Location:
Milpitas, California
Industry:
Information Technology and Services
Work:
Magic Moments since Jan 1998
Owner/Operator Kelly-Moore Paints since Aug 1989
Tinter KELLY-MOORE PAINT COMPANY since Jan 1989
Customer Service Representative, Assistant Manager
Education:
Univers of Phoenix 1999 - 2003
BSIT, information Technology University of Phoenix
B.S. degree, Information Technology; General Education
Richard Wise Photo 65

Richard Wise

Location:
United States
Education:
United States Military Academy at West Point 1966 - 1970
brown boy, slacking West Point 1966 - 1970
BS, War
Richard Wise Photo 66

Richard Wise

Location:
United States
Richard Wise Photo 67

Richard Wise

Location:
United States
Richard Wise Photo 68

Richard Wise

Location:
United States
Richard Wise Photo 69

Richard Wise

Location:
United States
Richard Wise Photo 70

Richard Wise - Denver, CO

Work:
Business Services Nov 2008 to 2000
Independent Consultant Broker One Real Estate Company - Evergreen, CO May 2004 to Nov 2008
Associate Real Estate Broker NeoForma, Inc - San Jose, CA Apr 2003 to May 2004
eCommerce Account Manager PeopleSoft USA, Inc - Pleasanton, CA Jul 1997 to May 2003
Customer Service Group, Account Executive
Education:
The Ohio State University - Columbus, OH 1981 to 1986
BS/BA in Accounting
Skills:
Windows Office Suite, Professional Writing, Internet Research

Publications & IP owners

Us Patents

Method Of Enhancing Surface Reactions By Local Resonant Heating

US Patent:
2004011, Jun 17, 2004
Filed:
Dec 16, 2002
Appl. No.:
10/320852
Inventors:
Bomy Chen - Cupertino CA, US
Rajarao Jammy - Hopewell Junction NY, US
Siddhartha Panda - Beacon NY, US
Richard Wise - New Windsor NY, US
Assignee:
International Business Machines Corporation - Armonk NY
International Classification:
C23F001/00
US Classification:
216/067000
Abstract:
Methods and an apparatus for processing a substrate. A first method comprising: reacting a layer formed on the substrate with a plasma to form a reaction product layer; and simultaneously exposing the reaction product layer to resonant radiation to volatilize the reaction product layer. A second method comprising: performing a plasma enhanced chemical vapor deposition to deposit a precursor layer on a substrate; and simultaneously heating the precursor layer by exposure of the precursor layer to resonant radiation to convert the precursor layer to a deposited layer.

Simplified Apparatus For Detection Of Leaks In Pressurized Pipelines

US Patent:
5415033, May 16, 1995
Filed:
Dec 17, 1993
Appl. No.:
8/170092
Inventors:
Joseph W. Maresca - Sunnyvale CA
James W. Starr - Bound Brook NJ
Christopher Wilson - La Honda CA
Richard F. Wise - Manville NJ
Assignee:
Vista Research, Inc. - Mountain View CA
International Classification:
G01M 328
US Classification:
73 405R
Abstract:
An apparatus for detection of leaks in pressurized pipelines which utilizes a large pressure vessel and a small measurement vessel. The measurement vessel magnifies level changes during leak detection tests. The apparatus is connected to a pipeline through the measurement vessel. The entire system can be filled with liquid from the pipeline by opening a valve between the measurement and pressure vessels. Leak detection tests are conducted by measuring changes in volume with the measurement vessel over time while the pressure over the liquid in the pressure vessel and measurement vessel is maintained approximately constant. During tests, liquid communication between the measurement vessel and pressure vessel is prevented by closing the valve between them, but vapor communication between the vessels is permitted.

Sensor For Measuring Liquid-Level Changes In Storage Tanks

US Patent:
5146784, Sep 15, 1992
Filed:
Mar 4, 1991
Appl. No.:
7/664320
Inventors:
Joseph W. Maresca - Sunnyvale CA
James W. Starr - Bound Brook NJ
Richard F. Wise - Manville NJ
Assignee:
Vista Research, Inc. - Mountain View CA
International Classification:
G01F 2360
H01F 2106
US Classification:
73313
Abstract:
The improved device for measuring liquid-level changes in storage tanks uses a float to track vertical displacement of the surface of a liquid and a linear variable differential transducer (LVDT) sensor positioned below the surface of the liquid to measure changes in the surface level. The center of gravity of the device is located below the center of buoyancy, thereby minimizing instability of the LVDT sensor.

Tin Oxide Films In Semiconductor Device Manufacturing

US Patent:
2022027, Aug 25, 2022
Filed:
Feb 10, 2022
Appl. No.:
17/650550
Inventors:
- Fremont CA, US
Samantha S.H. Tan - Newark CA, US
Yu Jiang - Sunnyvale CA, US
Hui-Jung Wu - Pleasanton CA, US
Richard Wise - Los Gatos CA, US
Yang Pan - Los Altos CA, US
Nader Shamma - Cupertino CA, US
Boris Volosskiy - San Jose CA, US
International Classification:
H01L 21/033
H01L 21/311
H01L 21/027
H01L 21/67
H01L 21/02
H01L 21/467
H01L 21/3065
H01L 21/3213
H01L 21/465
Abstract:
A method of processing a substrate includes: providing a substrate having one or more mandrels comprising a mandrel material, wherein a layer of a spacer material coats horizontal surfaces and sidewalls of the one or more mandrels; and etching and completely removing the layer of the spacer material from the horizontal surfaces of the one or more mandrels and thereby exposing the mandrel material, without completely removing the spacer material residing at the sidewalls of the one or more mandrels. The etching includes exposing the substrate to a plasma formed using a mixture comprising a first gas and a polymer-forming gas, and wherein the etching comprises forming a polymer on the substrate. Polymer-forming gas may include carbon (C) and hydrogen (H).

Atomic Layer Etch And Selective Deposition Process For Extreme Ultraviolet Lithography Resist Improvement

US Patent:
2022021, Jul 7, 2022
Filed:
Apr 14, 2020
Appl. No.:
17/594744
Inventors:
- Fremont CA, US
Samantha S.H. Tan - Fremont CA, US
Liu Yang - Seattle WA, US
Chen-Wei Liang - El Cerrito CA, US
Boris Volosskiy - San Jose CA, US
Richard Wise - Los Gatos CA, US
Yang Pan - Los Altos CA, US
Da Li - Newark CA, US
Ge Yuan - New Haven CT, US
Andrew Liang - San Jose CA, US
Assignee:
Lam Research Corporation - Fremont CA
International Classification:
H01L 21/02
Abstract:
Provided herein are methods and systems for reducing roughness of an EUV resist and improving etched features. The methods involve descumming an EUV resist, filling divots of the EUV resist, and protecting EUV resists with a cap. The resulting EUV resist has smoother features and increased selectivity to an underlying layer, which improves the quality of etched features. Following etching of the underlying layer, the cap may be removed.

Integrated Dry Processes For Patterning Radiation Photoresist Patterning

US Patent:
2023004, Feb 9, 2023
Filed:
Jul 2, 2021
Appl. No.:
17/758125
Inventors:
- Fremont CA, US
Samantha S.H. Tan - Newark CA, US
Mohammed Haroon Alvi - San Jose CA, US
Richard Wise - Los Gatos CA, US
Yang Pan - Los Altos CA, US
Richard Alan Gottscho - Menlo Park CA, US
Adrien LaVoie - Newberg OR, US
Sivananda Krishnan Kanakasabapathy - Pleasanton CA, US
Timothy William Weidman - Sunnyvale CA, US
Qinghuang Lin - Yorktown Heights NY, US
Jerome S. Hubacek - Fremont CA, US
International Classification:
H01L 21/67
G03F 7/16
G03F 7/004
G03F 7/38
G03F 7/36
Abstract:
Methods for making thin-films on semiconductor substrates, may be patterned using EUV, include: depositing the organometallic polymer-like material onto the surface of the semiconductor substrate, exposing the surface to EUV to form a pattern, and developing the pattern for later transfer to underlying layers. The depositing operations may be performed by chemical vapor deposition (CVD), atomic layer deposition (ALD), and ALD with a CVD component, such as a discontinuous, ALD-like process in which metal precursors and counter-reactants are separated in either time or space.

Tin Oxide Films In Semiconductor Device Manufacturing

US Patent:
2021026, Aug 26, 2021
Filed:
May 13, 2021
Appl. No.:
17/302850
Inventors:
- Fremont CA, US
Samantha S.H. Tan - Fremont CA, US
Yu Jiang - San Jose CA, US
Hui-Jung Wu - Pleasanton CA, US
Richard Wise - Los Gatos CA, US
Yang Pan - Los Altos CA, US
Nader Shamma - Cupertino CA, US
Boris Volosskiy - San Jose CA, US
International Classification:
H01L 21/033
H01L 21/311
H01L 21/027
H01L 21/67
H01L 21/02
H01L 21/467
H01L 21/3065
H01L 21/3213
H01L 21/465
Abstract:
Tin oxide film on a semiconductor substrate is etched selectively in a presence of photoresist by exposing the substrate to at least one of hydrogen-based chemistry and chlorine-based chemistry. In some implementations, a method of processing a semiconductor substrate starts by providing a semiconductor substrate having a patterned photoresist layer overlying a tin oxide layer. Next, openings are etched in the tin oxide layer using the patterned photoresist layer as a mask, and using at least one of a hydrogen-based etch chemistry and a chlorine-based etch chemistry. After the openings have been etched in the tin oxide layer, the photoresist layer is removed using an oxygen-based etch chemistry.

Tin Oxide Mandrels In Patterning

US Patent:
2021026, Aug 26, 2021
Filed:
May 13, 2021
Appl. No.:
17/302847
Inventors:
- Fremont CA, US
Samantha S.H. Tan - Fremont CA, US
Seongjun Heo - Dublin CA, US
Boris Volosskiy - San Jose CA, US
Sivananda Krishnan Kanakasabapathy - Pleasanton CA, US
Richard Wise - Los Gatos CA, US
Yang Pan - Los Altos CA, US
Hui-Jung Wu - Pleasanton CA, US
International Classification:
H01L 21/3213
C04B 41/91
C04B 41/53
C23C 16/455
C23C 16/34
C23C 16/40
C23C 16/02
H01L 21/311
H01L 21/67
H01L 21/465
H01L 21/467
H01L 21/033
Abstract:
Tin oxide films are used as mandrels in semiconductor device manufacturing. In one implementation the process starts by patterning a tin oxide layer using at least one of a hydrogen-based etch chemistry and a chlorine-based etch chemistry, and using patterned photoresist as a mask, thereby providing a substrate having a plurality of protruding tin oxide features (mandrels). Next, a conformal layer of spacer material is formed both on the horizontal surfaces and on the sidewalls of the mandrels. The spacer material is then removed from the horizontal surfaces exposing the tin oxide material of the mandrels, without fully removing the spacer material residing at the sidewalls of the mandrels. Next, mandrels are selectively removed (e.g., using hydrogen-based etch chemistry), while leaving the spacer material that resided at the sidewalls of the mandrels. The resulting spacers can be used for patterning underlying layers on the substrate.

Isbn (Books And Publications)

Interactions Between Tactics And Technology In Ground Warfare: Prepared For The Defense Advanced Research Projects Agency

Author:
Richard Albert Wise
ISBN #:
0833000888

Guide To Canadian Business Valuations

Author:
Richard M. Wise
ISBN #:
0459573829

How To Grow When Markets Don'T

Author:
Richard Wise
ISBN #:
0446531774

How To Grow When Markets Don'T

Author:
Richard Wise
ISBN #:
0446692700

Surgical Sepsis

Author:
Richard Wise
ISBN #:
0808912089

Possible Relatives

A W Wise  Dawn M Wise  Dalton C Wise  Damon D Wise  Dana E Wise  Daniel Wise  Aaron D Wise  Richard A Stamps  Richard A Standish  Richard L Standley 

NOTICE: You may not use PeopleBackgroundCheck or the information it provides to make decisions about employment, credit, housing or any other purpose that would require Fair Credit Reporting Act (FCRA) compliance. PeopleBackgroundCheck is not a Consumer Reporting Agency (CRA) as defined by the FCRA and does not provide consumer reports.