Ady I Hershcovitch, Age 7935 Autumn Dr, Mount Sinai, NY 11766

6528948, Mar 4, 2003

Oct 11, 2000

09/685227

Ady Hershcovitch - Mount Sinai NY
Sushil Sharma - Hinsdale IL
John Noonan - Naperville IL
Elbio Rotela - Clarendon Hills IL
Ali Khounsary - Hinsdale IL

Brookhaven Science Associates LLC - Upton NY

H01J 724

31511171, 31511121, 31511131, 31511161, 313178, 21912148, 21912157

A plasma valve includes a confinement channel and primary anode and cathode disposed therein. An ignition cathode is disposed adjacent the primary cathode. Power supplies are joined to the cathodes and anode for rapidly igniting and maintaining a plasma in the channel for preventing leakage of atmospheric pressure through the channel.

7075030, Jul 11, 2006

Aug 30, 2004

10/932653

Ady Hershcovitch - Mount Sinai NY, US
Rory Dominick Montano - Canton CT, US

Brookhaven Science Associates, LLC - Upton NY

B23K 10/00

21912136, 21912148, 21912159, 20429821, 250423 R

An apparatus includes a plasma generator aligned with a beam generator for producing a plasma to shield an energized beam. An electrode is coaxially aligned with the plasma generator and followed in turn by a vortex generator coaxially aligned with the electrode. A target is spaced from the vortex generator inside a fluid environment. The electrode is electrically biased relative to the electrically grounded target for driving the plasma toward the target inside a vortex shield.

4942339, Jul 17, 1990

Sep 27, 1988

7/249813

Ady Hershcovitch - Mount Sinai NY
Vincent J. Kovarik - Bohemia NY
Krsto Prelec - Setauket NY

The United States of America as represented by the United States
Department of Energy - Washington DC

H01J 2900

31511181

An intense, steady state, low emittance electron beam generator is formed by operating a hollow cathode discharge plasma source at critical levels in combination with an extraction electrode and a target electrode that are operable to extract a beam of fast primary electrons from the plasma source through a negatively biased grid that is critically operated to repel bulk electrons toward the plasma source while allowing the fast primary electrons to move toward the target in the desired beam that can be successfully transported for relatively large distances, such as one or more meters away from the plasma source.

4654183, Mar 31, 1987

Feb 13, 1984

6/579747

Ady Hershcovitch - Mount Sinai NY

The United States of America as represented by the United States
Department of Energy - Washington DC

G21G 404

376130

A process for selectively neutralizing H. sup. - ions in a magnetic field to produce an intense negative hydrogen ion beam with spin polarized protons. Characteristic features of the process include providing a multi-ampere beam of H. sup. - ions that are intersected by a beam of laser light. Photodetachment is effected in a uniform magnetic field that is provided around the beam of H. sup. - ions to spin polarize the H. sup. - ions and produce first and second populations or groups of ions, having their respective proton spin aligned either with the magnetic field or opposite to it. The intersecting beam of laser light is directed to selectively neutralize a majority of the ions in only one population, or given spin polarized group of H. sup. - ions, without neutralizing the ions in the other group thereby forming a population of H. sup. - ions each of which has its proton spin down, and a second group or population of H. sup.

5578831, Nov 26, 1996

Mar 23, 1995

8/409148

Ady Hershcovitch - Mount Sinai NY

Associated Universities, Inc. - Washington DC

H01J 37317

250398

A method and apparatus are provided for propagating charged particles from a vacuum to a higher pressure region. A generator 14,14b includes an evacuated chamber 16a,b having a gun 18,18b for discharging a beam of charged particles such as an electron beam 12 or ion beam 12b. The beam 12,12b is discharged through a beam exit 22 in the chamber 16a,b into a higher pressure region 24. A plasma interface 34 is disposed at the beam exit 22 and includes a plasma channel 38 for bounding a plasma 40 maintainable between a cathode 42 and an anode 44 disposed at opposite ends thereof. The plasma channel 38 is coaxially aligned with the beam exit 22 for propagating the beam 12,12b from the chamber 16a,b, through the plasma 40, and into the higher pressure region 24. The plasma 40 is effective for pumping down the beam exit 22 for preventing pressure increase in the chamber 16a,b, and provides magnetic focusing of the beam 12,12b discharged into the higher pressure region 24.

2014024, Sep 4, 2014

Mar 15, 2013

13/837756

- Oxnard CA, US
Henry J. Poole - Ventura CA, US
Nader Jamshidi - Newbury Park CA, US
Ady Hershcovitch - Upton NY, US

C23C 14/35

20429808, 295921

A sputtering apparatus that includes at least a target presented as an inner surface of a confinement structure, the inner surface of the confinement structure is preferably an internal wall of a circular tube. A cathode is disposed adjacent the internal wall of the circular tube. The cathode preferably provides a hollow core, within which a magnetron is disposed. Preferably, an actuator is attached to the magnetron, wherein a position of the magnetron within the hollow core is altered upon activation of the actuator. Additionally, a carriage supporting the cathode and communicating with the target is preferably provided, and a cable bundle interacting with the cathode and linked to a cable bundle take up mechanism provides power and coolant to the cathode, magnetron, actuator and an anode of the sputtering apparatus.

2014024, Sep 4, 2014

Mar 1, 2013

13/782270

- Oxnard CA, US
Henry J. Poole - Ventura CA, US
Ady Hershcovitch - Mount Sinai NY, US

POOLE VENTURA, INC. - Oxnard CA

C23C 14/04
C23C 14/35

20429809, 20429822

A sputtering apparatus that includes at least a target presented as an inner surface of a confinement structure, the inner surface of the confinement structure is preferably an internal wall of a circular tube. A cathode is disposed adjacent the internal wall of the circular tube. The cathode preferably provides a hollow core, within which a magnetron is disposed. Preferably, an actuator is attached to the magnetron, wherein a position of the magnetron within the hollow core is altered upon activation of the actuator. Additionally, a carriage supporting the cathode and communicating with the target is preferably provided, and a cable bundle interacting with the cathode and linked to a cable bundle take up mechanism provided power and coolant to the cathode, magnetron, actuator and an anode of the sputtering apparatus.

2014023, Aug 28, 2014

Jul 20, 2012

14/129812

Ady Itzchak Hershcovitch - Mount Sinai NY, US
Oleg Alexeyenko - Moscow, RU
Timur Kulevoy - Moscow, RU
Rostislav Kuibeda - Moscow, RU
Efim Oks - Tomsk, RU
Vasiliy Gushenets - Tomsk, RU
Pavel Storozhenko - Moscow, RU
Ella Gurkova - Moscow, RU
Sergey Dugin - Moscow, RU
Gennady Kropachev - Moscow, RU
Dimitri Seleznev - Podolsk Moscow Region, RU

H01J 37/08
C07F 5/05

250424, 568 5, 562594

The uninterrupted production of an ion beam with self-cleaning of a discharge chamber and extractor system, including extraction aperture(s), of an ion implantation device. The method increases the time of continuous operation of the ion implantation device, and therefore, increases total implantation time without reducing intensity. As a result, the time integrated output of the ion implantation device is increased. The method includes feeding a working molecule comprising at least two boron atoms and a strong oxidizer into an ion implantation device and removing gaseous compounds from the ion implantation device, wherein said working molecule provides upon fragmentation a polyatomic boron-containing ion, and the strong oxidizer which reacts with solid products of decomposition of the working molecule to form said gaseous compounds. A working molecule including at least two boron atoms and at least one strong oxidizer is also disclosed. Examples of the working molecule include CHBO, such as 1,7-m-carborane dicarboxylic acid or o-carborane-1,2-dicarboxylic acid.