Barry Brent Wise, Age 6263 County Road 2117, Douglassville, TX 75560

Barry Wise Phones & Addresses

Douglassville, TX

2700 Landershire Ln, Plano, TX 75023 (972) 612-8669

Queen City, TX

Duncanville, TX

Morris Plains, NJ

Richardson, TX

Dallas, TX

2700 Landershire Ln, Plano, TX 75023 (972) 754-2418

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Work

Company: Itcn.com Address: 58 Phoenix Ave, Morristown, NJ 07960 Phones: (973) 538-9066 Position: President Industries: Computer Integrated Systems Design

Education

Degree: Associate degree or higher

Emails

Mentions for Barry Brent Wise

Barry Wise resumes & CV records

Resumes

Barry Wise Photo 36

Principal At Wise Retail Consultants

Position:
Principal at Wise Retail Consultants
Location:
Dallas/Fort Worth Area
Industry:
Retail
Work:
Wise Retail Consultants
Principal
Barry Wise Photo 37

Barry Wise

Location:
Dallas/Fort Worth Area
Industry:
Information Technology and Services
Skills:
Retail, POS, Marketing Strategy, New Business Development
Barry Wise Photo 38

Barry Wise

Location:
United States

Publications & IP owners

Us Patents

System And Method For Determining Endpoint In Etch Processes Using Partial Least Squares Discriminant Analysis In The Time Domain Of Optical Emission Spectra

US Patent:
6830939, Dec 14, 2004
Filed:
Aug 28, 2002
Appl. No.:
10/232987
Inventors:
Kenneth C. Harvey - Dallas TX
Jimmy W. Hosch - Dallas TX
Neal B. Gallagher - Manson WA
Barry M. Wise - Manson WA
Assignee:
Verity Instruments, Inc. - Carrollton TX
International Classification:
H01L 21302
US Classification:
438 8, 9 16, 9714, 216 60, 134 12, 134 2211
Abstract:
The present invention is directed to a system, method and software product for creating a predictive model of the endpoint of etch processes using Partial Least Squares Discriminant Analysis (PLS-DA). Calibration data is collected from a calibration wafer using optical emission spectroscopy (OES). The data may be non-periodic or periodic with time and periodic signals may be sampled synchronously or non-synchronously. The OES data is arranged in a spectra matrix X having one row for each data sample. The OES data is processed depending upon whether or not it is synchronous. Synchronous data is arranged in an unfolded spectra matrix X having one row for each period of data samples. A previewed endpoint signal is plotted using wavelengths known to exhibit good endpoint characteristics. Regions of stable intensity values in the endpoint plot that are associated with either the etch region or the post-etch region are identified by sample number. An X-block is created from the processed OES data samples associated with the two regions of stable intensity values.

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