People Background Check
Find People:

Benjamin H Painter, Age 55255 Seaside Dr, Sharp Park, CA 94044

Get Report
Known as:
Benjamin M Painter Benjaminh Painter
Related to:
Lisa L Mcdonald 35

Benjamin Painter Phones & Addresses

255 Seaside Dr, Pacifica, CA 94044

74 North Ave, Ellijay, GA 30540 (706) 276-1660

Daly City, CA

3143 Fillmore St, San Francisco, CA 94123 (415) 447-9886

3143 Fillmore St #303, San Francisco, CA 94123 (415) 447-9886

Big Rapids, MI

Marietta, GA

Pensacola, FL

1765 15Th Ave, San Francisco, CA 94122 (415) 447-9886

Show more

Work

Position: Personal Care and Service Occupations

Education

Degree: High school graduate or higher

Mentions for Benjamin H Painter

Career records & work history

License Records

Benjamin Painter

Licenses:
License #: 978421 - Expired
Category: Swimming Pool Operator
Issued Date: May 4, 2007
Effective Date: Mar 24, 2010
Expiration Date: May 4, 2009
Type: Swimming Pool Operator

Publications & IP owners

Us Patents

Sub-Resolution Assist Feature Implementation For Shot Generation

US Patent:
2017003, Feb 2, 2017
Filed:
Oct 10, 2016
Appl. No.:
15/289919
Inventors:
- Mountain View CA, US
Thomas Christopher Cecil - Menlo Park CA, US
Benjamin David Painter - Portland OR, US
International Classification:
G06F 17/50
G03F 1/36
Abstract:
A design layout for a semiconductor chip includes information on shapes desired to be fabricated. Clusters of photolithographic exposure “shots” are generated and subject to a measure of shot density to approximate a mask shape that generates the desired fabricated shapes when exposed during wafer fabrication. A simulation is run on the clusters of shots to estimate the resulting fabrication shapes that the clusters of shots create. The clusters of shots are modified to align the estimated fabrication shapes more closely with desired fabrication shapes. The process of simulating and modifying the shots is iterative, repeating until the estimated fabrication shapes are within a desired error difference of the planned fabrication shape.

Sub-Resolution Assist Feature Implementation With Shot Optimization

US Patent:
2016004, Feb 11, 2016
Filed:
Oct 26, 2015
Appl. No.:
14/922569
Inventors:
- Mountain View CA, US
Thomas Christopher Cecil - Menlo Park CA, US
Benjamin David Painter - Portland OR, US
International Classification:
G06F 17/50
Abstract:
A design layout for a semiconductor chip includes information on shapes desired to be fabricated. Clusters of photolithographic exposure “shots” are generated and subject to a measure of shot density to approximate a mask shape that generates the desired fabricated shapes when exposed during wafer fabrication. A simulation is run on the clusters of shots to estimate the resulting fabrication shapes that the clusters of shots create. The clusters of shots are modified to align the estimated fabrication shapes more closely with desired fabrication shapes. The process of simulating and modifying the shots is iterative, repeating until the estimated fabrication shapes are within a desired error difference of the planned fabrication shape.

Sub-Resolution Assist Feature Implementation Using Shot Optimization

US Patent:
2014028, Sep 18, 2014
Filed:
Mar 14, 2014
Appl. No.:
14/213813
Inventors:
- Mountain View CA, US
Thomas Christopher Cecil - Menlo Park CA, US
Benjamin David Painter - Portland OR, US
Assignee:
Synopsys, Inc. - Mountain View CA
International Classification:
G06F 17/50
US Classification:
716 51
Abstract:
A design layout for a semiconductor chip includes information on shapes desired to be fabricated. Clusters of photolithographic exposure “shots” are generated and subject to a measure of shot density to approximate a mask shape that generates the desired fabricated shapes when exposed during wafer fabrication. A simulation is run on the clusters of shots to estimate the resulting fabrication shapes that the clusters of shots create. The clusters of shots are modified to align the estimated fabrication shapes more closely with desired fabrication shapes. The process of simulating and modifying the shots is iterative, repeating until the estimated fabrication shapes are within a desired error difference of the planned fabrication shape.

Possible Relatives

A M Painter  Debbie L Painter  Denise E Painter  Darlene M Painter  Dave T Painter  Dewey R Painter  Diana L Painter  Benjamin B Joiner  Benjamin J Stanton  Benjamin O Staples 

NOTICE: You may not use PeopleBackgroundCheck or the information it provides to make decisions about employment, credit, housing or any other purpose that would require Fair Credit Reporting Act (FCRA) compliance. PeopleBackgroundCheck is not a Consumer Reporting Agency (CRA) as defined by the FCRA and does not provide consumer reports.