David B Fenner, Age 8035A Stonybrook Rd, Westford, MA 01886

David Fenner Phones & Addresses

35 Stonybrook Rd, Westford, MA 01886 (978) 589-9540

35A Stonybrook Rd, Westford, MA 01886 (781) 589-9540

35E Stonybrook Rd, Westford, MA 01886

7 Metacom Dr, Simsbury, CT 06070 (860) 651-0130 (860) 651-1250

Weatogue, CT

35A Stonybrook Rd, Westford, MA 01886 (978) 589-9540

Work

Company: A-z auto center inc - Brighton, MA Oct 2006 Position: Manager

Education

School / High School: Melrose High School- Melrose, MA 1991 Specialities: High School Diploma in Business

Ranks

Licence: Virginia - Authorized to practice law Date: 2008

Mentions for David B Fenner

Career records & work history

Lawyers & Attorneys

David Fenner Photo 1

David Thomas Fenner - Lawyer

Licenses:
Virginia - Authorized to practice law 2008
Specialties:
Fraud - 100%
David Fenner Photo 2

David Fenner - Lawyer

Specialties:
Fraud, Fraud
ISLN:
1000357810
Admitted:
2008
Law School:
Capital University Law School, J.D.

Medicine Doctors

David L. Fenner

Specialties:
Pediatrics, Adolescent Medicine
Work:
Children's Medical GroupChildrens Medical Group
104 Fulton Ave, Poughkeepsie, NY 12603
(845) 452-1700 (phone) (845) 452-1752 (fax)
Site
Children's Medical GroupThe Childrens Medical Group
29 Elm St, Fishkill, NY 12524
(845) 452-1700 (phone) (845) 452-1752 (fax)
Site
Children's Medical GroupChildrens Medical Group
1918 Rte 44 55, Modena, NY 12548
(845) 452-1700 (phone) (845) 452-1752 (fax)
Site
Children's Medical GroupChildrens Medical Group
5 Ryan Rd, Hopewell Junction, NY 12533
(845) 452-1700 (phone) (845) 452-1752 (fax)
Site
Children's Medical GroupChildrens Medical Group
450 Gidney Ave, Newburgh, NY 12550
(845) 452-1700 (phone) (845) 452-1752 (fax)
Site
Children's Medical GroupChildrens Medical Group
4252 Albany Post Rd, Hyde Park, NY 12538
(845) 452-1700 (phone) (845) 452-1752 (fax)
Site
Children's Medical GroupChildrens Medical Group Pediatric
187 E Market St #308, Rhinebeck, NY 12572
(845) 452-1700 (phone) (845) 452-1752 (fax)
Site
Children's Medical GroupChildrens Medical Group
551 Rte 22, Pawling, NY 12564
(845) 452-1700 (phone) (845) 452-1752 (fax)
Site
Education:
Medical School
Albert Einstein College of Medicine at Yeshiva University
Graduated: 1980
Conditions:
Abdominal Hernia, Acute Pharyngitis, Anxiety Phobic Disorders, Attention Deficit Disorder (ADD), Autism, Chronic Sinusitis, Constipation, Croup, Hearing Loss, Lyme Disease, Otitis Media, Pneumonia, Skin and Subcutaneous Infections, Urinary Incontinence, Acute Bronchitis, Acute Conjunctivitis, Acute Otitis Externa, Acute Sinusitis, Acute Upper Respiratory Tract Infections, Allergic Rhinitis, Anemia, Anorexia Nervosa, Anxiety Dissociative and Somatoform Disorders, Atopic Dermatitis, Bronchial Asthma, Burns, Cataract, Congenital Anomalies of the Heart, Cystic Fibrosis (CF, Epilepsy, Gingival and Periodontal Diseases, Glaucoma, Infectious Mononucleosis, Iron Deficiency Anemia, Obsessive-Compulsive Disorder (OCD), Peripheral Nerve Disorders, Plantar Warts, Poisoning by Drugs, Meds, or Biological Substances, Post Traumatic Stress Disorder (PTSD), Sickle-Cell Disease, Tempromandibular Joint Disorders (TMJ), Undescended and Retractile Testicle
Languages:
English, Spanish
Description:
Dr. Fenner graduated from the Albert Einstein College of Medicine at Yeshiva University in 1980. He works in Hyde Park, NY and 7 other locations and specializes in Pediatrics and Adolescent Medicine. Dr. Fenner is affiliated with Mid Hudson Regional Hospital Of Westchester Medical Center, Saint Francis Hospital The Heart Center and Vassar Brothers Medical Center.

License Records

David E Fenner Rp

Licenses:
License #: 7573 - Active
Category: Pharmacy
Issued Date: Feb 1, 1964
Expiration Date: Jan 1, 2018
Type: Pharmacist

David Fenner resumes & CV records

Resumes

David Fenner Photo 51

Consultant

Location:
Westford, MA
Industry:
Research
Work:
Museum of Science, Boston 2012 - 2014
Volunteer
Various R&D 2012 - 2014
Consultant
Physical Sciences Inc. Jun 2005 - Jan 2012
Principal Research Scientist
Epion Corp Jan 1998 - Dec 2003
Chief Scientist
David Fenner Photo 52

David Fenner

David Fenner Photo 53

David Dianne Fenner

David Fenner Photo 54

David Fenner

David Fenner Photo 55

David Fenner

Location:
United States
David Fenner Photo 56

Architect At Self Employed

Position:
Architect at Self Employed
Location:
Columbia, Maryland
Industry:
Architecture & Planning
Work:
Self Employed
Architect
Education:
Tennessee Technological University 1971 - 1976
BS, Electrical Engineering
Glen Burnie HS
Skills:
Carpentry, Plumbing, House Design
David Fenner Photo 57

David Fenner

Location:
United States
David Fenner Photo 58

David Fenner

Location:
United States

Publications & IP owners

Us Patents

Adaptive Gcib For Smoothing Surfaces

US Patent:
6375790, Apr 23, 2002
Filed:
Oct 5, 1999
Appl. No.:
09/412949
Inventors:
David B. Fenner - Westford MA
Assignee:
Epion Corporation - Billerica MA
International Classification:
C23F 102
US Classification:
156345, 118723 CB, 31511181
Abstract:
A method and apparatus for adapting the nature of an ion beam during processing of the surface of a solid workpiece so as to improve the reduction of surface roughness (smoothing) by using a GCIB. In addition, the invention provides for surface smoothing in combination with etching to predetermined depths and surface contamination removal. Advantages are minimum required processing time, minimum remaining roughness of the final surface, and reduction in the amount of material that must be removed in order to attain a desired level of smoothness.

Interface Control For Film Deposition By Gas-Cluster Ion-Beam Processing

US Patent:
6498107, Dec 24, 2002
Filed:
May 1, 2000
Appl. No.:
09/563035
Inventors:
David B. Fenner - Westford MA
Assignee:
Epion Corporation - Billerica MA
International Classification:
H01L 21302
US Classification:
438706, 438712, 438745
Abstract:
Methods are disclosed for gas-cluster ion-beam deposition of thin films on silicon wafers rendered free of native oxides by termination of the surface bonds and subsequent reactive deposition. Hydrogen termination of the surface of silicon renders it inert to reoxidation from oxygen-containing environmental gasses, even those found as residue in vacuum systems, such as those used to deposit films. Nitrogen termination improves the interface with overlying metal-oxide thin films. The film is formed in intimate contact with the silicon crystal surface forming a nearly ideal interface.

System And Method For Improving Thin Films By Gas Cluster Ion Beam Processing

US Patent:
6537606, Mar 25, 2003
Filed:
Jul 10, 2001
Appl. No.:
09/902306
Inventors:
Lisa P. Allen - Beverly MA
David B. Fenner - Westford MA
Assignee:
Epion Corporation - Billerica MA
International Classification:
B05D 100
US Classification:
427 9, 427 8, 427534, 20419211, 20419234, 20429804, 20429836, 118723 CB, 118712, 118664, 118688, 216 38, 216 59, 216 66
Abstract:
The present invention provides apparatus and methods to carry out the task of both reducing the surface roughness (smoothing) and improving the thickness uniformity of, preferably, but not limited thereto, the top silicon film of a silicon-on-insulator (SOI) wafer or similar thin-film electronic and photonic materials (workpiece). It also provides a method and apparatus for smoothing the surface of a (preferably) SOI wafer (workpiece) and for making the surface of the silicon film of a (preferably) SOI wafer cleaner and more free from contaminants.

Adaptive Gcib For Smoothing Surfaces

US Patent:
6805807, Oct 19, 2004
Filed:
Oct 31, 2001
Appl. No.:
09/999099
Inventors:
David B. Fenner - Westford MA
Assignee:
Epion Corporation - Billerica MA
International Classification:
H01L 21302
US Classification:
216 38, 216 52, 216 60, 216 66, 438714
Abstract:
A method of processing the surface of a workpiece using an adaptive gas cluster ion beam is disclosed. The invention provides a method of reducing the surface roughness and/or improving the surface smoothing of a workpiece by etching at various etch rates. The workpiece is initially processed with a gas cluster ion beam having an initial etch rate and then the beam is adjusted so that the workpiece is processed with one or more lower etch rates. The advantages are minimum required processing time, minimum remaining roughness of the final surface, and minimum material removal in order to attain a desired level of smoothness.

Superconducting Detector Assembly And Apparatus Utilizing Same

US Patent:
5354989, Oct 11, 1994
Filed:
Dec 28, 1992
Appl. No.:
7/997457
Inventors:
David B. Fenner - Simsbury CT
Robert M. Carangelo - Glastonbury CT
Assignee:
Advanced Fuel Research Inc. - East Hartford CT
International Classification:
G01J 351
H01L 27146
H01L 3900
US Classification:
2503362
Abstract:
An array of superconducting bolometers, assembled with a superposed interference layer of graduated thickness, provides a microelectronic detector assembly that discriminates radiation impinging thereon, as a function of wavelength, and that can be used for transform spectroscopy, color-imaging, and the like. The interference coating will preferably be of step-like form, with each plateau of the structure being of the same spatial extent as the bolometer with which it is associated.

Superconducting Detector Assembly And Apparatus Utilizing Same

US Patent:
RE35872, Aug 18, 1998
Filed:
Apr 17, 1996
Appl. No.:
8/633483
Inventors:
David B. Fenner - Simsbury CT
Robert M. Carangelo - Glastonbury CT
Assignee:
Advanced Fuel Research, Inc. - East Hartford CT
International Classification:
G01J 351
H01L 27146
H01L 3900
US Classification:
2503362
Abstract:
An array of superconducting bolometers, assembled with a superposed interference layer of graduated thickness, provides a microelectronic detector assembly that discriminates radiation impinging thereon, as a function of wavelength, and that can be used for transform spectroscopy, color-imaging, and the like. The interference coating will preferably be of step-like form, with each plateau of the structure being of the same spatial extent as the bolometer with which it is associated.

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