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David R Hagemeier, Age 622903 W Woodfield Dr APT 123N, Thiensville, WI 53092

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Known as:
David R Hagemier Davi Hagemeier Hagemeier Davi
Related to:
James O Hux 95 James L Hux 72

David Hagemeier Phones & Addresses

2903 W Woodfield Dr APT 123N, Mequon, WI 53092 (262) 242-2379

2903 Woodfield Ct, Mequon, WI 53092

2903 Woodfield Dr, Thiensville, WI 53092

29 Hemlock Rd, Andover, MA 01810

1 Allen Bradley Dr, Cleveland, OH 44124

Chelmsford, MA

Rochester Hills, MI

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Mentions for David R Hagemeier

David Hagemeier resumes & CV records

Resumes

David Hagemeier Photo 16

Business & Technology Executive | Busines Owner

Position:
Owner and Principal at Signature Two Company
Location:
Greater Milwaukee Area
Industry:
Consumer Services
Work:
Signature Two Company since Oct 2012
Owner and Principal Rockwell Automation - Greater Milwaukee Area Sep 2007 - Sep 2012
Director, Global Customer Information Rockwell Automation Jan 1985 - Aug 2007
Rockwell Automation
Education:
University of Wisconsin-Milwaukee 2008 - 2008
MBA University of Wisconsin - Milwaukee 2003 - 2006
Center for Creative Leadership
BS Computer Engineering - Oakland University
Skills:
Cross-functional Team Leadership, Process Improvement, Program Management, Change Management, Business Process Improvement, Team Leadership, Team Building, Business Intelligence, Leadership, Project Management
Interests:
Leadership, Mobile Applications, Social Media, Business Development, Project Management, Strategic Planning, Employee Development, Mentoring, Teamwork, Change Management, Long Distance Running, Travel, Music, Audiophile, Reading.
David Hagemeier Photo 17

David Hagemeier

Publications & IP owners

Us Patents

Photoelectric Sensor Having Dust Removal Apparatus

US Patent:
5879626, Mar 9, 1999
Filed:
Jul 30, 1997
Appl. No.:
8/902707
Inventors:
Richard L. Watterson - Antrim NH
David R. Hagemeier - Andover MA
James J. Boschuetz - Wausau WI
Assignee:
Allen-Bradley Company, LLC - Milwaukee WI
International Classification:
G02B 700
US Classification:
422 62
Abstract:
A photoelectric sensor has its own cleaning system which accommodates different possibilities for mounting the photoelectric sensor, so that it is no longer necessary to custom design cleaning systems. The photoelectric sensor includes an optical lens and a cleaning device which cleans the optical lens. The cleaning device further includes a fluid chamber coupled to a source of fluid, and a fluid dispenser in fluid communication with the fluid chamber and disposed adjacent the optical lens. The fluid dispenser is operative to dispense fluid on the optical lens to clean the optical lens. In a preferred embodiment, the cleaning system uses a pulse of air to remove dust from the optical lens of the photoelectric sensor.

Possible Relatives

Nathan M Hagemeier  Allen Hagemeier  David J Last  David K Stancil  David J Stancombe  David R Standefer  David A Standen  David O Standridge  David L Stanfill  David W Stange 

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