David W Hawn, Age 568535 Portland Ave, Minneapolis, MN 55420

David Hawn Phones & Addresses

8535 Portland Ave, Bloomington, MN 55420 (952) 884-9563

Minneapolis, MN

Farmington, MN

Irvine, CA

Saint Paul, MN

New Albany, MS

Burnsville, MN

Dakota, MN

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Work

Position: Service Occupations

Education

Degree: Graduate or professional degree

Emails

Mentions for David W Hawn

David Hawn resumes & CV records

Resumes

David Hawn Photo 35

Chief Executive Officer

Location:
Minneapolis, MN
Industry:
Financial Services
Work:
Urban Ventures
Chief Executive Officer
Ecmc Group
President and Chief Executive Officer
Ecmc Jul 2011 - Jan 2014
Chief Operating Officer
Ecmc May 2010 - Nov 2011
Chief Marketing Officer and President and Chief Executive Officer of Ecmc Solutions
Ecmc Feb 2008 - Jul 2010
Senior Vice President
Clc Aug 2004 - Feb 2008
Chief Operations Officer
Student Capital/College Loan Corp 2004 - Feb 2008
Chief Operations Officer
College Loan Corporation 2004 - 2008
Chief Operations Officer
Wells Fargo 1997 - 2004
Executive Vice President
Northstar Guarantee 1991 - 1997
Vice President
Education:
University of Minnesota
Skills:
Leadership, Strategic Planning, Team Building, Process Improvement, Management, Marketing, Public Speaking, Coaching, Customer Service, Leadership Development, Business Development, Staff Development, Vendor Management, Business Analysis, Risk Management, Training, Program Management, Strategy, Change Management, Financial Services, Budgets, Business Strategy, Microsoft Office, Project Management, New Business Development, Operations Management, Call Centers, Sales, Team Leadership, Banking, Financial Analysis, Sales Management, Entrepreneurship, Call Center, Salesforce.com, Mergers, Business Intelligence, Credit, Data Analysis
David Hawn Photo 36

David Hawn

David Hawn Photo 37

Operational Maintance Manager

Work:

Operational Maintance Manager
David Hawn Photo 38

David Hawn

David Hawn Photo 39

David Hawn

David Hawn Photo 40

David Hawn

David Hawn Photo 41

David Hawn

David Hawn Photo 42

David Hawn

Publications & IP owners

Us Patents

Highly Swellable Composite Polyamide Membrane

US Patent:
2016031, Nov 3, 2016
Filed:
Dec 15, 2014
Appl. No.:
15/104023
Inventors:
- Midland MI, US
Nicholas S. Beck - Minneapolis MN, US
Robert C. Cieslinski - Midland MI, US
Bruce B. Gerhart - Midland MI, US
David D. Hawn - Midland MI, US
Duane Jacobson - Minneapolis MN, US
Mou Paul - Edina MN, US
Carl W. Reinhardt - Kawkawlin MI, US
Katmerka Tabakovic - Edina MN, US
Ian A. Tomlinson - Midland MI, US
International Classification:
B01D 69/12
B01D 67/00
B01D 71/56
Abstract:
A method for making a composite polyamide membrane including the step of applying a polar solution including a polyfunctional amine monomer and a non-polar solution comprising a polyfunctional acyl halide monomer to a surface of a porous support and interfacially polymerizing the monomers to form a thin film polyamide layer, wherein the method is characterized by including a tri-hydrocarbyl phosphate within the polar coating solution. The thin film polyamide layer is characterized by possessing an equilibrium water swelling factor of greater than 35% as measured by PFT-AFM.

Composite Polyamide Membrane With Improved Structure

US Patent:
2015016, Jun 18, 2015
Filed:
Jul 3, 2013
Appl. No.:
14/407366
Inventors:
Abhishek Roy - Edina MN, US
Tina L. Arrowood - Elko New Market MN, US
Anand S. Badami - Midland MI, US
Robert C. Cieslinski - Midland MI, US
David D. Hawn - Midland MI, US
Steven D. Jons - Eden Prairie MN, US
Mou Paul - Edina MN, US
Steven Rosenberg - Shorewood MN, US
Huang Wu - Midland MI, US
International Classification:
B01D 71/56
B01D 69/12
B01D 69/10
B01D 67/00
Abstract:
A thin film composite polyamide membrane having a porous support and a thin film polyamide layer comprising a reaction product of m-phenylene diamine (mPD) and trimesoyl chloride (TMC), characterized by the thin film polyamide layer having a critical strain value of less than 10%. In another embodiment, the thin film polyamide layer has a modulus of greater than 0.75 (GPa). In yet another embodiment, the thin film polyamide layer has an equilibrium swelling value of at least 45%. In another embodiment, the thin film polyamide layer has a thickness of at least 230 nm.

Composite Polyamide Membrane With Carboxylic Acid Functionality

US Patent:
2015015, Jun 11, 2015
Filed:
Jul 3, 2013
Appl. No.:
14/407362
Inventors:
- Midland MI, US
Tina L. Arrowood - Elko New Market MN, US
Anand S. Badami - Midland MI, US
Robert C. Cieslinski - Midland MI, US
Bruce B. Gerhart - Midland MI, US
David D. Hawn - Midland MI, US
Steven D. Jons - Eden Prairie MN, US
Mou Paul - Edina MN, US
Martin H. Peery - Bloomington MN, US
XiaoHua sam Qiu - Midland MI, US
Mark A. Rickard - Midland MI, US
Steven Rosenberg - Shorewood MN, US
Ian A. Tomlinson - Midland MI, US
Cheng Li Zu - Midland MI, US
International Classification:
B01D 71/56
B01D 69/12
Abstract:
A thin film composite polyamide membrane including a porous support and a thin film polyamide layer which is a reaction product of m-phenylene diamine (mPD) and trimesoyl chloride (TMC), wherein the membrane is characterized by the thin film polyamide layer having a dissociated carboxylic acid content of at least 0.18 moles/kg at pH 9.5, and wherein pyrolysis of the thin film polyamide layer at 650 C results in a ratio of responses from a flame ionization detector for fragments produced at 212 m/z and 237 m/z of less than 2.8.

Composite Polyamide Membrane

US Patent:
2015015, Jun 4, 2015
Filed:
Jul 3, 2013
Appl. No.:
14/405711
Inventors:
- Midland MI, US
Tina L. Arrowood - Elko New Market MN, US
Robert C. Cieslinski - Midland MI, US
Derek M. Stevens - Chanhassen MN, US
David D. Hawn - Midland MI, US
Steven D. Jons - Eden Prairie MN, US
Mou Paul - Edina MN, US
Martin H. Peery - Bloomington MN, US
Steven Rosenberg - Shorewood MN, US
Ian A. Tomlinson - Midland MI, US
Assignee:
Dow Global Technologies LLC - Midland MI
International Classification:
B01D 69/12
Abstract:
A method for making a composite polyamide membrane comprising a porous support and a thin film polyamide layer, wherein the method includes the step of applying a polyfunctional amine monomer and polyfunctional acyl halide monomer to a surface of the porous support and interfacially polymerizing the monomers to form a thin film polyamide layer, wherein the step of applying the polyfunctional acyl halide monomer to the porous support includes the step of combining the polyfunctional acyl halide monomer with a non-polar solvent at a concentration of at least 0.18 weight percent to form a coating solution which is applied to the surface of the porous support, and wherein the interfacial polymerization is conducted in the presence of a tri-hydrocarbyl phosphate compound which is provided in a molar ratio of at least 0.5:1 with the polyfunctional acyl halide monomer. Many additional embodiments are described including membranes made from the subject method and applications for such membranes.

Composite Polyamide Membrane With Increased Carboxylic Acid Functionality

US Patent:
2015012, May 14, 2015
Filed:
Jul 3, 2013
Appl. No.:
14/406994
Inventors:
- Midland MI, US
Tina L. Arrowood - Elko New Market MN, US
Robert C. Cieslinski - Midland MI, US
David D. Hawn - Midland MI, US
Steven D. Jons - Eden Prairie MN, US
Mou Paul - Edina MN, US
Martin H. Peery - Bloomington MN, US
XiaoHua Qiu - Midland MI, US
Steven Rosenberg - Shorewood MN, US
Ian A. Tomlinson - Midland MI, US
Chengli Zu - Midland MI, US
Assignee:
DOW GLOBAL TECHNOLOGIES LLC - Midland MI
THE DOW CHEMICAL COMPANY - Midland MI
International Classification:
B01D 71/56
B01D 69/10
B01D 67/00
B01D 69/12
US Classification:
210489, 427244
Abstract:
A thin film composite membrane including a porous support and a thin film polyamide layer characterized by having a dissociated carboxylate content of at least 0.45 moles/kg at pH 9.5 and a method for making a composite polyamide applying a polar solution comprising a polyfunctional amine monomer and a non-polar solution comprising a polyfunctional amine-reactive monomer to a surface of the porous support and interfacially polymerizing the monomers to form a thin film polyamide layer, wherein the method is characterized by the non-polar solution comprising at least 0.025 wt % of an acid compound including at least one carboxylic acid moiety and at least one amine-reactive moiety selected from acyl halide and anhydride.

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