Dennis R Strauss, Age 7121 Azusa Ave, Ventura, CA 93004

7108819, Sep 19, 2006

May 16, 2003

10/439503

Alan B Harker - Thousand Oaks CA, US
Jeffrey F DeNatale - Thousand Oaks CA, US
Dennis R Strauss - Ventura CA, US

The Boeing Company - Chicago IL

B29C 33/38

264219, 205 70, 216 2, 216 11, 216 53, 216 57, 264293

A tool for embossing high aspect ratio microstructures is provided, wherein the microstructures provide decreased surface reflection and increased transmission through an optical component even at high incident angles. The tool is fabricated by a process that comprises anisotropic etching of columnar pits in a silicon substrate using inductively coupled plasma, followed by isotropic reactive ion etching of the columnar pits to create relatively pointed obelisks. The silicon substrate is then preferably rinsed to remove remaining photoresist prior to vapor depositing a conductive layer thereon. Finally, a metal is electroformed over the conductive layer to form the embossing tool. The embossing tool is then pressed against an optical coating, for example a polymer sheet, to create microstructures having aspect ratios from 1 to 5.

7419615, Sep 2, 2008

Jun 30, 2005

11/160600

Dennis R. Strauss - Ventura CA, US

The Boeing Company - Chicago IL

B44C 1/22

216 83, 216 67, 428426, 427180

A method of forming a superhydrophobic material () includes mixing a hydrophobic material () with soluble particles () to form a mixture (). The mixture () is cured. A portion of the soluble particles () is etched away from the mixture () to form the superhydrophobic material (). A superhydrophobic material forming system () includes a mixer () that mixes a hydrophobic binder () with soluble particles () to form the mixture (). A curing station () cures the mixture (). An applicator () applies a solvent () to the mixture () to etch away a portion of the soluble particles () from the mixture () to form the superhydrophobic material ().

7687205, Mar 30, 2010

Jun 15, 2006

11/453707

Dennis R. Strauss - Ventura CA, US

The Boeing Company - Chicago IL

G03F 1/00

430 5, 430311, 355 53, 355 69

A photolithographic method and associated apparatus are provided that permit three-dimensional structures to be defined in a photoresist coating in such a manner that multi-level structures can be formed which have constant width at different depths within the photoresist coating. The photolithographic method and apparatus may permit such three-dimensional structures to be defined within a photoresist coating with the use of a single polychromatic mask and, optionally, a micro-lens array. By designing the polychromatic mask to have a plurality of regions that selectively pass and block respective wavelengths of light, the photoresist coating can be selectively illuminated with light have different wavelengths. As a result of the optical absorption characteristics of the photoresist coating, the different wavelengths of light propagate to different depths within the photoresist coating, thereby defining multi-level microstructures therein.

7695767, Apr 13, 2010

Jan 6, 2005

11/030501

Dennis R Strauss - Ventura CA, US

The Boeing Company - Chicago IL

B05D 3/00
B05D 3/04

427299, 427307, 427327

A method for providing a superhydrophobic surface on a structure, for example aircraft wings, propellers and/or rotors, is set forth. The method includes applying a coating of hydrofluoric acid over a titanium substrate. A voltage is then applied across the titanium substrate so that current flows through the titanium substrate. The current flowing through the titanium substrate causes the hydrofluoric acid to react with the titanium substrate to anodize the titanium substrate. The anodization causes a nanoporous titanium oxide layer to grow across the titanium substrate. The titanium oxide layer includes a plurality of nano-tube structures that, once the remaining hydrofluoric acid is washed away, provide a microscopically rough surface on the titanium substrate. A conformal coating of a hydrophobic compound is then desposited on the microscopically rough surface to create a superhydrophobic surface. Thus, a substantially self-cleaning superhydrophobic surface is created on the titanium substrate, whereby, when exposed to ultraviolet light, the titanium oxide layer has a photocatalytic reaction with oxygen to oxidize any organic contaminants that may gather on the superhydrophobic surface.

8292092, Oct 23, 2012

Sep 8, 2009

12/555670

Dennis R. Strauss - Ventura CA, US
Martin W. Kendig - Thousand Oaks CA, US

Teledyne Scientific & Imaging, LLC - Thousand Oaks CA

B01D 63/00

21050022, 21050027, 21050028, 21050023, 4234471, 977746, 977748, 977750

A macrocyclic pore-apertured carbon nanotube apparatus is disclosed. The carbon nanotube apparatus can be used to filter or exclude ions, solutes in solution, as well as particles suspended in a colloidal mixture. The nanotube apparatus includes a carbon nanotube having a carboxylated portion at least one pore entrance and at least one molecular aperture adapted to be bonded to the carboxylated portion of the carbon nanotube. The molecular aperture is further adapted to prevent dissolved ions in a solution from entering the pore entrance. Methods for preparing and using the apparatus are also disclosed. The apparatus can also be incorporated into to filtration media for conducting reverse osmosis filtration.

8491970, Jul 23, 2013

Sep 29, 2010

12/894043

Dennis Strauss - Ventura CA, US
Vivek Mehrotra - Simi Valley CA, US

Teledyne Scientific & Imaging, LLC - Thousand Oaks CA

B05D 1/04

427474, 427472

A method and device for producing an aligned carbon nanotube array. The arrays of aligned carbon nanotubes (CNTs) may be formed by drying liquid dispersions of CNTs on a nanoporous substrate under an applied electrostatic field. The array may be used in a number of applications including electronics, optics, and filtration, including desalination.

8580371, Nov 12, 2013

Jan 18, 2010

12/689035

Dennis R. Strauss - Ventura CA, US

The Boeing Company - Chicago IL

B32B 5/00
B32B 5/18
B32B 15/04
B32B 15/08
B32B 15/082
B32B 15/14
B32B 18/00

428142, 428141, 428336, 428339, 428364, 428375, 428376, 428378, 428398, 428421, 428422, 428457, 428469, 428472, 4284721, 4274192, 4274195, 205198, 205199, 205200, 205220

A superhydrophobic structure that may have a titanium substrate and nanoporous titanium oxide layer grown on the titanium substrate by anodization. The titanium oxide layer may have a plurality of nano-tube structures that create a microscopically rough surface on the titanium substrate. A hydrophobic coating may be deposited over the titanium oxide layer to create a superhydrophobic surface on the titanium substrate. The titanium oxide layer may provide a photocatalytic reaction with oxygen in surrounding air to oxidize organic contaminants on the superhydrophobic surface.

2003003, Feb 27, 2003

Aug 27, 2001

09/939972

Alan Harker - Thousand Oaks CA, US
Jeffrey DeNatale - Thousand Oaks CA, US
Dennis Strauss - Ventura CA, US

B44C001/22
C23F001/00
B32B001/08
C25F003/00
B29D011/00
C03C025/68
C25D001/00

205/067000, 216/008000, 216/009000, 216/011000, 216/067000, 216/002000, 216/099000, 216/024000, 216/054000

A process for embossing high aspect ratio microstructures is provided, wherein the microstructures provide decreased surface reflection and increased transmission through an optical component. The process comprises etching columnar pits in a silicon substrate using inductively coupled plasma, followed by reactive ion etching of the columnar pits to create relatively pointed obelisks. The silicon substrate is then preferably rinsed prior to vapor depositing a conductive layer thereon. Further, a metal is electroformed over the conductive layer to form an embossing tool. The embossing tool is then used to form microstructures, for example in a polymer sheet, having aspect ratios greater than 5 to 1.