Ernesto U Ulloa, Age 53192 Coy Dr UNIT 3, San Jose, CA 95123

2008025, Oct 16, 2008

Apr 16, 2007

11/735941

Khai Ngo - Cedar Park TX, US
Son Nguyen - San Jose CA, US
Ernesto Ulloa - San Jose CA, US

G01F 25/00

137486, 73 136, 738659

The present invention generally provides methods and apparatus for monitoring performance of an injection valve. In one embodiment, a control signal relates to an actuator movement is monitored and correlated to performance of the injection valve.

2012020, Aug 9, 2012

Feb 2, 2012

13/364806

Kenric Choi - San Jose CA, US
Tatsuya E. Sato - San Jose CA, US
Ernesto Ulloa - San Jose CA, US

Applied Materials, Inc. - Santa Clara CA

C23C 16/52
C23C 16/455
C23C 16/02

427255394, 118697, 118708, 118719, 118729

Described are systems and methods for the hydroxylation of a substrate surface using ammonia and water vapor.

2013001, Jan 24, 2013

Jul 20, 2012

13/554487

Kenric Choi - San Jose CA, US
Joseph Yudovsky - Campbell CA, US
Steven D. Marcus - San Jose CA, US
Ernesto Ulloa - San Jose CA, US

Applied Materials, Inc. - Santa Clara CA

F16K 49/00
F16K 11/00

137334, 137627

Provided are apparatus and methods for generating a chemical precursor. The apparatus comprises an inlet line to be connected to an ampoule and an outlet line to be connected to an ampoule. The inlet line having an inlet valve to control the flow of a carrier gas into the ampoule and the outlet line has an outlet valve to control the flow exiting the ampoule. A bypass valve allows carrier gas to bypass the ampoule and purge the outlet valve without flowing gas into the ampoule.

2018027, Sep 27, 2018

Mar 24, 2017

15/469113

- Santa Clara CA, US
Ernesto ULLOA - San Jose CA, US

B08B 7/00
H01L 21/677
H01L 21/02
H01L 21/3065

Embodiments of the disclosure generally relate to an improved batch processing load lock chamber, a cluster tool having the same and a method of using the improved load lock chamber to clean a plurality of substrates disposed within. In one embodiment, a load lock chamber includes a chamber body, a cassette disposed in the chamber body, a remote plasma source, a plurality of inlet nozzles and a plurality of outlet ports. The chamber body has a plurality of substrate transfer slots formed therein. The cassette has a plurality of substrate storage slots and is configured to move up and down within the chamber body. The plurality of inlet nozzles is coupled to the remote plasma source and faces a processing region defined within the chamber body. The plurality of outlet ports faces the plurality of inlet nozzles across the processing region.