Guenther O Langner DeceasedAlbany, NY

4468565, Aug 28, 1984

Dec 31, 1981

6/336204

William W. Blair - Stormville NY
Samuel K. Doran - Wappingers Falls NY
Guenther O. Langner - Hopewell Junction NY

International Business Machines Corporation - Armonk NY

B23Q 1512
G01B 1114

2504911

An automatic focus correction system for E-beam lithography uses optical light from a narrow angle light source to illuminate a horizontal slit, the image of which is projected onto a target surface. Prior to and after reflection of the slit image from the target surface the light beam is projected parallel to the target surface to minimize vertical space requirements in the E-beam column. Variations in height, z-position, cause the slit image to move vertically and the focus of reflection to shift laterally and this image is redeflected in the horizontal plane by a prism to a linear diode array used to produce a video-type output signal. Autofocus electronics are used to convert the video output signal into an analog correction signal to the E-beam fine focus coil. The video-type signal is also converted to a digital height value to be used for corrections in beam magnification and rotation.

5757010, May 26, 1998

Dec 18, 1996

8/769083

Guenther O. Langner - Fultonville NY

International Business Machines Corporation - Armonk NY

G21K 108
G21K 510
G02B 2710

250396ML

An improved particle lens has an axis that is shifted to follow the central ray of the beam as it is deflected through the lens creating, in effect, a variable curvilinear optical axis for the lens and introducing aberrations having depending on the object size and the distance off the lens symmetry axis. These aberrations are corrected by a set of correction elements generating compensating aberrations of the same type, comprising at least one wire pair perpendicular to the system axis and carrying fixed currents to introduce a gradient in the field, together with three coils centered on the system axis to cancel a bias field introduced by the wire pair.

5136167, Aug 4, 1992

Jan 7, 1991

7/638241

Guenther O. Langner - Poughkeepsie NY
Paul F. Petric - Brewster NY

International Business Machines Corporation - Armonk NY

H01J 3730
H01J 3710

250396R

A charged particle beam deflection system provides a three or more level charged particle beam deflection arrangement and is therefore capable of extremely high speed and positional accuracy. The system preferably employs a major/minor magnetic deflection arrangement as well as orthogonal electrostatic deflectors at a level of speed and positional accuracy and which minimizes the need for dynamic correction to achieve high linearity and positioning accuracy at extremely low aberration levels. The system can also be made relatively noise insensitive by providing one or more split deflectors which are also useful in providing increased speed and adjustment of radial and azimuthal telecentricity. The use of a transfer lens allows the cluster and subfield deflectors to be optimally placed to exploit different forms of LAD to obtain telecentricity at all levels of the deflection hierarchy. The use of such lens assisted deflection allows the electron optical system and drivers therefor to be minimized in number or enabled noise to be reduced and adjustments of telecentricity to be made without increase of complexity over the prior art.

5389858, Feb 14, 1995

Jul 16, 1992

7/915798

Guenther O. Langner - Fultonville NY
Paul F. Petric - Brewster NY

International Business Machines Corporation - Armonk NY

G09G 104
G21K 108
H01J 314

315370

The magnetic axis of a stigmation yoke is varied from the mechanical axis of the stigmation yoke by differentially driving pairs of coils in a quadrupole configuration with currents which differ from a nominal stigmation current by approximately equal amounts, applied in opposite senses. Set-up procedures for electron beam deflection systems, such as in e-beam tools, are automated by emulating manual procedures in combination with electrical alteration of the magnetic axis of the stigmator yoke. Stigmation errors can also be corrected under automated set-up procedure control to allow dynamic correction of astigmatism in electron beam deflection system. Electrically variability of the magnetic axis of the stigmator yoke also allows the placement of the stigmator yoke at a position in the electron optical column other than prior to deflection stages as well as improved freedom from positional and aberrational errors.

5793048, Aug 11, 1998

Dec 18, 1996

8/769047

Paul F. Petric - Brewster NY
Guenther O. Langner - Fultonville NY

International Business Machines Corporation - Armonk NY

G21K 108

250396ML

An improved particle lens has an axis that is shifted to follow the central ray of the beam as it is deflected through the lens creating, in effect, a variable curvilinear optical axis for the lens and introducing aberrations depending on the object size and the distance off the lens symmetry axis. These aberrations are corrected by a set of wire pairs perpendicular to the system axis to add a gradient of the z-component of the magnetic field by which aberrations are generated of the same type but opposite direction as those inherent in the system.

5708274, Jan 13, 1998

Dec 18, 1996

8/769084

Guenther O. Langner - Fultonville NY
Werner Stickel - Ridgefield CT

International Business Machines Corporation - Armonk NY

H01J 3714

250396ML

A charged particle lens has an axis that is shifted to follow the central ray of the beam as it is deflected through the lens creating, in effect, a variable curvilinear optical axis for the lens and introducing aberrations having depending on the object size and the distance off the lens symmetry axis. These aberrations are corrected by a set of coil pairs tilted with respect to the system axis, which generate compensating aberrations of the same type.

4415851, Nov 15, 1983

May 26, 1981

6/267118

Guenther O. Langner - Hopewell Junction NY
Hans C. Pfeiffer - Ridgefield CT

International Business Machines Corporation - Armonk NY

G01R 3102

324 51

A system of testing the continuity of electrical conductors extending through an insulating layer without contact. A flood gun irradiates one side of the body to charge the exposed conductors to a given potential. A steerable electron beam scans the front side to generate secondary electron emission from those conductors. The secondary emission is enhanced from conductors with conductivity between front side and back side as a result of the surface potential established by the rear flood beam. The secondary emission varies depending on the state of continuity in the three dimensional network of conductors and produces signals at the detector which allow clear discrimination between uninterrupted and interrupted conductors. The system is applicable for unfired ceramics where contact destroys the specimen.

4376249, Mar 8, 1983

Nov 6, 1980

6/204427

Hans C. Pfeiffer - Ridgefield CT
Guenther O. Langner - Hopewell Junction NY
Maris A. Sturans - Bedford NY

International Business Machines Corporation - Armonk NY

H01J 320

250396ML

An electron beam projection system having a projection lens arranged so that upon pre-deflection of the electron beam the electron optical axis of the lens shifts to be coincident with the deflected beam. The projection system includes means for producing an electron beam, means for deflecting the beam, a magnetic projection lens having rotational symmetry for focusing the deflected beam and a pair of magnetic compensation yokes positioned within the bore of the projection lens means. The pair of correction yokes has coil dimensions such that, in combination, they produce a magnetic compensation field proportional to the first derivative of the axial magnetic field strength distribution curve of the projection lens. Upon application of current to the pair of compensation yokes the electron optical axis of the projection lens shifts to the position of the deflected beam so that the electron beam remains coincident with the shifted electron optical axis and lands perpendicular to a target.