Ian Livingston13820 S 44Th St UNIT 1345, Phoenix, AZ 85044

Ian Livingston Phones & Addresses

13820 44Th St, Phoenix, AZ 85044

Mentions for Ian Livingston

Ian Livingston resumes & CV records

Resumes

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Principal Design Engineer

Location:
Phoenix, AZ
Industry:
Semiconductors
Work:
Renesas Electronics Corporation
Principal Design Engineer
Microchip Technology
Senior Process Integration Engineer Ii
Freescale Semiconductor Aug 1998 - Apr 2004
Senior Device Engineer
Allegro Microsystems, Llc Oct 1994 - Apr 1996
Photo and Etch Process Engineer
Harris Semiconductor Inc 1990 - 1993
Co-Op
Education:
Arizona State University 2013 - 2018
Doctorates, Doctor of Philosophy, Electrical Engineering, Electronics, Electronics Engineering, Philosophy
Rochester Institute of Technology 1996 - 1998
Master of Science, Masters, Engineering
Rochester Institute of Technology 1987 - 1993
Bachelors, Bachelor of Science, Engineering
Williamsport Area High School 1983 - 1987
Skills:
Silicon, Semiconductors, Cmos, Jmp, Design of Experiments, Process Integration, Ic, Failure Analysis, Microelectronics, Spc, Analog, Yield, Product Engineering, Silvaco, Semiconductor Device, Integrated Circuits, Statistical Process Control, Mixed Signal, Thin Films, Cadence Virtuoso, Cadence Icfb, Cadence Spectre, Mosfet, Electronics, Semiconductor Industry, Process Engineering, Manufacturing, Cross Functional Team Leadership, Matlab
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Ian Livingston

Ian Livingston Photo 42

Ian Livingston

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Ian Livingston

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Ian Livingston

Publications & IP owners

Wikipedia

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Ian Livingst

Ian Livingston (born 28 July 1964, in Glasgow, Scotland is the Chief Executive Officer of BT Group (commonly known as British Telecom). The fourth generation son

Us Patents

Multiple Well Drain Engineering For Hv Mos Devices

US Patent:
2013002, Jan 31, 2013
Filed:
Jul 20, 2012
Appl. No.:
13/554890
Inventors:
Gregory Dix - Tempe AZ, US
Leighton E. McKeen - Gilbert AZ, US
Ian Livingston - Chandler AZ, US
Roger Melcher - Gilbert AZ, US
Rohan Braithwaite - Gilbert AZ, US
International Classification:
H01L 21/336
H01L 29/78
US Classification:
257288, 438286, 257E29255, 257E21409
Abstract:
At least one N-well implant having a different doping level is formed in a silicon substrate by first etching the substrate with an alignment target for aligning future process masks thereto. This alignment target is outside of any active device area. By using at least one N-well implant having a different doping level in combination with the substrate, a graded junction in the drift area of a metal oxide semiconductor (MOS) field effect transistor (FET) can be created and a pseudo Ldd structure may be realized thereby.

Isbn (Books And Publications)

El Talisman De La Muerte/The Talisman Of Death

Author:
Ian Livingston
ISBN #:
8437221080

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