Sok Gek Tan, Age 64163 S Grand Oaks Ave, Pasadena, CA 91107

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Arcadia, CA

Alhambra, CA

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Us Patents

Methods For Cleaning A Set Of Structures Comprising Yttrium Oxide In A Plasma Processing System

US Patent:
2005016, Jul 28, 2005
Filed:
Sep 17, 2003
Appl. No.:
10/666331
Inventors:
Hong Shih - Walnut CA, US
Anthony Chen - Pleasanton CA, US
Sok Tan - Union City CA, US
Stephen Hwang - Fremont CA, US
John Daugherty - Newark CA, US
Bruno Morel - Santa Clara CA, US
International Classification:
B08B007/00
US Classification:
134026000, 134006000
Abstract:
A method of removing a set of particles from a set of structures including yttrium oxide is disclosed. The method includes exposing the set of structures to a first solution including an oxidizer for a first period. The method also includes removing the set of structures from the first solution, and exposing the set of structures to a second solution including a keytone reagent for a second period. The method further includes removing the set of structures from the second solution, and mechanically rubbing the set of structures with a third solution including a first set of acids for a third period.

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