James Tappan1217 Inverness Ct, Fremont, CA 94539

James Tappan Phones & Addresses

1217 Inverness Ct, Fremont, CA 94539 (510) 249-9553

Alameda, CA

Mentions for James Tappan

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James Tappan Photo 31

Medical Expert Reviewer, Medical Board Of California

Position:
Obstetrician-Gynecologist at Barstow Community Hospital, Medical Expert Reviewer at Medical Board of California, Medical-Legal Consulting at James G. Tappan, M.D., FACOG, FACS, Owner at JAMES G. TAPPAN, M.D. & ASSOCIATES
Location:
San Francisco Bay Area
Industry:
Medical Practice
Work:
Barstow Community Hospital since Jun 2012
Obstetrician-Gynecologist
Medical Board of California since Sep 2010
Medical Expert Reviewer
James G. Tappan, M.D., FACOG, FACS since Apr 1991
Medical-Legal Consulting
JAMES G. TAPPAN, M.D. & ASSOCIATES since Jan 1986
Owner
David Grant USAF Medical Center, Travis AFB 2006 - 2012
Obstetrician-Gynecologist
Education:
University of California, San Francisco - School of Medicine 1965 - 1969
Doctor of Medicine (M.D.)
University of California, Berkeley 1962 - 1965
Bachelor of Arts (B.A.), Psychology
James Tappan Photo 32

James Tappan

Location:
United States

Publications & IP owners

Wikipedia

James Tappan Photo 33

James Camp Tappan

James Camp Tappan (September 9, 1825 March 19, 1906) was a brigadier general in the Confederate States Army during the American Civil War.

Us Patents

Loop Dilution System

US Patent:
6998095, Feb 14, 2006
Filed:
Aug 15, 2003
Appl. No.:
10/641480
Inventors:
Marc R. Anderson - Sunnyvale CA, US
Michael J. West - Sunnyvale CA, US
James Tappan - Sunnyvale CA, US
Assignee:
Metara, Inc. - Sunnyvale CA
International Classification:
B01L 11/00
US Classification:
422103, 422 81
Abstract:
A loop dilution system includes a dual-loop multi-way valve. In a first configuration of the multi-way valve, a first loop may be filled with a first solution and a second loop may be filled with a second solution. In a second configuration of the multi-way valve, the first and second loops are serially connected with a pump so that their contents may be mixed with a diluent. In another aspect of the invention, an in-process mass spectrometry (IPMS) system is disclosed that uses an internal standard to determine the concentration of an analyte in a sample. The internal standard has a different molecular composition than the analyte but is sufficiently similar chemically and physically to the analyte such that it behaves substantially the same as the analyte during an ionization process in the mass spectrometer.

Module For Automated Matrix Removal

US Patent:
7132080, Nov 7, 2006
Filed:
Aug 15, 2003
Appl. No.:
10/641946
Inventors:
Marc R. Anderson - Sunnyvale CA, US
Michael J. West - Sunnyvale CA, US
James Tappan - Sunnyvale CA, US
Assignee:
Metara, Inc. - Sunnyvale CA
International Classification:
B01L 3/00
US Classification:
422 99, 422267, 422100, 422101, 2104161, 210791, 210767, 2101981, 436177, 436188
Abstract:
An automated matrix removal module is configurable to automatically withdraw a portion of sample containing an interferent. The module is further configurable to mix the portion of sample with a precipitating reagent selected to react with the interferent to form a precipitant and then filter mixture of sample and precipitant reagent through a filter. Finally, the module is further configurable to flush the precipitant from the filter.

Multiple Electrospray Probe Interface For Mass Spectrometry

US Patent:
7439499, Oct 21, 2008
Filed:
Mar 22, 2006
Appl. No.:
11/386389
Inventors:
Thomas H. Bailey - Sunnyvale CA, US
James E. Tappan - Sunnyvale CA, US
Assignee:
Metara, Inc. - Sunnyvale CA
International Classification:
H01J 49/26
H01J 49/04
G01N 11/00
US Classification:
250288, 250285, 250423 R, 250425
Abstract:
In one embodiment, an analytical apparatus is provided that includes a carriage; and a plurality of electrospray probes pivotably mounted on the carriage, wherein movement of the carriage engages a feature with a selected one of the electrospray probes whereby movement of the feature pivots the selected one of the electrospray probes with respect to the carriage.

Apparatus For Spatial And Temporal Control Of Temperature On A Substrate

US Patent:
8038796, Oct 18, 2011
Filed:
Dec 30, 2004
Appl. No.:
11/027481
Inventors:
Anthony J. Ricci - Sunnyvale CA, US
Keith Comendant - Fremont CA, US
James Tappan - Fremont CA, US
Assignee:
Lam Research Corporation - Fremont CA
International Classification:
H01L 21/67
H01L 21/02
C23C 14/50
US Classification:
118724, 118725, 15634527, 15634552, 15634553, 361234, 279128
Abstract:
An apparatus for control of a temperature of a substrate has a temperature-controlled base, a heater, a metal plate, a layer of dielectric material. The heater is thermally coupled to an underside of the metal plate while being electrically insulated from the metal plate. A first layer of adhesive material bonds the metal plate and the heater to the top surface of the temperature controlled base. This adhesive layer is mechanically flexible, and possesses physical properties designed to balance the thermal energy of the heaters and an external process to provide a desired temperature pattern on the surface of the apparatus. A second layer of adhesive material bonds the layer of dielectric material to a top surface of the metal plate. This second adhesive layer possesses physical properties designed to transfer the desired temperature pattern to the surface of the apparatus. The layer of dielectric material forms an electrostatic clamping mechanism and supports the substrate.

Method Of Manufacturing Apparatus For Spatial And Temporal Control Of Temperature On A Substrate

US Patent:
8051556, Nov 8, 2011
Filed:
Sep 22, 2008
Appl. No.:
12/232673
Inventors:
Anthony J. Ricci - Sunnyvale CA, US
Keith Comendant - Fremont CA, US
James Tappan - Fremont CA, US
Assignee:
Lam Research Corporation - Fremont CA
International Classification:
C23C 14/50
C23C 16/46
H01L 21/00
US Classification:
29757, 361234, 279128, 118725, 15634552
Abstract:
An apparatus for control of a temperature of a substrate has a temperature-controlled base, a heater, a metal plate, a layer of dielectric material. The heater is thermally coupled to an underside of the metal plate while being electrically insulated from the metal plate. A first layer of adhesive material bonds the metal plate and the heater to the top surface of the temperature controlled base. This adhesive layer is mechanically flexible, and possesses physical properties designed to balance the thermal energy of the heaters and an external process to provide a desired temperature pattern on the surface of the apparatus. A second layer of adhesive material bonds the layer of dielectric material to a top surface of the metal plate. This second adhesive layer possesses physical properties designed to transfer the desired temperature pattern to the surface of the apparatus. The layer of dielectric material forms an electrostatic clamping mechanism and supports the substrate.

Electrode Orientation And Parallelism Adjustment Mechanism For Plasma Processing Systems

US Patent:
8257548, Sep 4, 2012
Filed:
Jul 3, 2008
Appl. No.:
12/167987
Inventors:
James E. Tappan - Fremont CA, US
Assignee:
Lam Research Corporation - Fremont CA
International Classification:
C23F 1/00
H01L 21/306
B05C 13/00
B05C 13/02
B05C 21/00
C23C 16/00
B23K 9/00
B23K 9/02
US Classification:
15634554, 15634547, 15634551, 118500, 118723 E, 118728, 118729, 21912143, 21912158
Abstract:
A mechanism for adjusting an orientation of an electrode in a plasma processing chamber is disclosed. The plasma processing chamber may be utilized to process at least a substrate, which may be inserted into the plasma processing chamber in an insertion direction. The mechanism may include a support plate disposed outside a chamber wall of the plasma processing chamber and pivoted relative to the chamber wall. The support plate may have a first thread. The mechanism may also include an adjustment screw having a second thread that engages the first thread. Turning the adjustment screw may cause translation of a portion of the support plate relative to the adjustment screw. The translation of the portion of the support plate may cause rotation of the support plate relative to the chamber wall, thereby rotating the electrode with respect to an axis that is orthogonal to the insertion direction.

Electrode Orientation And Parallelism Adjustment Mechanism For Plasma Processing Systems

US Patent:
8394233, Mar 12, 2013
Filed:
Aug 1, 2012
Appl. No.:
13/563931
Inventors:
James E. Tappan - Fremont CA, US
Assignee:
Lam Research Corporation - Fremont CA
International Classification:
C23F 1/00
H01L 21/306
B05C 13/00
B05C 13/02
C23C 16/00
B23K 9/00
B23K 9/02
US Classification:
15634554, 15634547, 15634551, 118500, 118723 E, 118728, 118729, 21912143, 21912158
Abstract:
A mechanism for adjusting an orientation of an electrode in a plasma processing chamber is disclosed. The plasma processing chamber may be utilized to process at least a substrate, which may be inserted into the plasma processing chamber in an insertion direction. The mechanism may include a support plate disposed outside a chamber wall of the plasma processing chamber and pivoted relative to the chamber wall. The support plate may have a first thread. The mechanism may also include an adjustment screw having a second thread that engages the first thread. Turning the adjustment screw may cause translation of a portion of the support plate relative to the adjustment screw. The translation of the portion of the support plate may cause rotation of the support plate relative to the chamber wall, thereby rotating the electrode with respect to an axis that is orthogonal to the insertion direction.

Floating Collar Clamping Device For Auto-Aligning Nut And Screw In Linear Motion Leadscrew And Nut Assembly

US Patent:
8438712, May 14, 2013
Filed:
Feb 4, 2009
Appl. No.:
12/365327
Inventors:
James E. Tappan - Fremont CA, US
Assignee:
Lam Research Corporation - Fremont CA
International Classification:
B23P 19/04
B25B 27/14
US Classification:
29271, 29256, 29255, 29259
Abstract:
An auto-aligning linear motion apparatus is provided. The apparatus includes a leadscrew. The apparatus also includes a nut arrangement configured to surround the leadscrew, wherein the nut arrangement includes at least a nut, a nut bracket, and a floating collar. A shoulder screw is inserted through a nut bracket slot of the nut bracket and a nut slot of the nut to rest at least partially within the floating collar. One dimension of the nut bracket slot is larger than a dimension through a cross-section area of the shoulder screw to enable the shoulder screw to move within the nut bracket slot to adjust the nut arrangement as the leadscrew is rotated to maintain a concentric relationship between the nut arrangement and the leadscrew.

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