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Jason N Saito, Age 45Bronxville, NY

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Related to:
Glenda G Graham 73 Robert O Tucker 72

Jason Saito Phones & Addresses

Bronxville, NY

221 E 106Th St APT 14C, New York, NY 10029

Fort Rucker, AL

3047 Baker St, San Francisco, CA 94123 (415) 921-8757

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Jason N Saito

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Work

Company: Project for return and opportunity in veterans education Dec 2012 to Feb 2014 Position: Office administrator and peer mentor

Education

Degree: Bachelors, Bachelor of Arts School / High School: Hunter College Specialities: Economics

Languages

Japanese

Ranks

Certificate: Master Diver

Industries

Public Safety

Mentions for Jason N Saito

Resumes & CV records

Resumes

Jason Saito Photo 20

Firefighter

Location:
New York, NY
Industry:
Public Safety
Work:
Project For Return and Opportunity In Veterans Education Dec 2012 - Feb 2014
Office Administrator and Peer Mentor New York City Fire Department Dec 2012 - Feb 2014
Firefighter United States Army Reserve Nov 2005 - Aug 2010
Firefighter Farmers Insurance Jun 2002 - Nov 2005
Insurance Producer
Education:
Hunter College
Bachelors, Bachelor of Arts, Economics
Languages:
Japanese
Certifications:
Master Diver

Publications & IP owners

Us Patents

Removable Opaque Coating For Accurate Optical Topography Measurements On Top Surfaces Of Transparent Films

US Patent:
2020012, Apr 23, 2020
Filed:
Oct 9, 2019
Appl. No.:
16/597131
Inventors:
- Milpitas CA, US
Prasanna Dighe - San Ramon CA, US
Xiaomeng Shen - San Jose CA, US
Jason Saito - San Jose CA, US
International Classification:
H01L 21/027
B82Y 20/00
G01B 11/24
H01L 21/66
G03F 7/09
Abstract:
A method of using removable opaque coating for accurate optical topography measurements on top surfaces of transparent films includes: depositing a highly reflective coating onto a top surface of a wafer, measuring topography on the highly reflective coating, and removing the highly reflective coating from the wafer. The highly reflective coating includes an organic material. The highly reflective coating comprises a refractive index value between one and two. The highly reflective coating comprises a complex wavelength greater than one at six-hundred and thirty-five nanometers. The highly reflective coating reflects at least twenty percent of incident light. The highly reflective coating when deposited maintains an underlayer pattern topography at a resolution of forty by forty micrometers. The highly reflective coating does not cause destructive stress to the wafer.

Possible Relatives

Debbie N Saito  Deborah A Saito  Emiko Saito  Hiroshi C Saito  Jean Saito  Kelly T Saito  Kyoko Y Saito  Jason D Standifer  Jason J Standley  Jason L Stanfill 

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