Jason Weldon Weigold, Age 518 Pine St, Plum Island, MA 01950

Jason Weigold Phones & Addresses

8 Pine St, Newburyport, MA 01950 (617) 996-9263

209 Willow Ave, Somerville, MA 02144

Laconia, NH

167 Hitching Post Ln, Bedford, NH 03110 (603) 472-2252

Ann Arbor, MI

Cambridge, MA

8 Pine St, Newburyport, MA 01950

Show more

Social networks

Jason Weldon Weigold

Linkedin

Work

Company: Memstaff inc. 2006 Position: President

Education

Degree: MSEE, Ph.D. School / High School: University of Michigan 1995 to 2000 Specialities: Solid State Electronics, Optics, MEMS

Skills

Semiconductors • Mems • Sensors • Characterization • Cmos • Ic • Product Development • Microfabrication • Digital Signal Processors • Etching • Design of Experiments • R&D • Nanotechnology • Testing • Product Management • Simulations • Team Building • Spc • Accelerometer • New Business Development • Strategic Planning • Microphones • Accelerometers

Industries

Semiconductors

Mentions for Jason Weldon Weigold

Jason Weigold resumes & CV records

Resumes

Jason Weigold Photo 8

President And Chief Executive Officer

Location:
8 Pine St, Newburyport, MA 01950
Industry:
Semiconductors
Work:
MEMStaff Inc. since 2006
President
Analog Devices Sep 2004 - Oct 2006
Staff Development Engineer
Analog Devices Oct 2002 - Sep 2004
Staff Development Engineer
Analog Devices 1992 - 1995
Intern
Unitrode Integrated Circuits Corporation 1990 - 1991
Intern
Education:
University of Michigan 1995 - 2000
MSEE, Ph.D., Solid State Electronics, Optics, MEMS
University of California, Los Angeles 1991 - 1995
BSEE, Electrical Engineering
Skills:
Semiconductors, Mems, Sensors, Characterization, Cmos, Ic, Product Development, Microfabrication, Digital Signal Processors, Etching, Design of Experiments, R&D, Nanotechnology, Testing, Product Management, Simulations, Team Building, Spc, Accelerometer, New Business Development, Strategic Planning, Microphones, Accelerometers

Publications & IP owners

Us Patents

Process Of Forming A Microphone Using Support Member

US Patent:
7449356, Nov 11, 2008
Filed:
Dec 19, 2006
Appl. No.:
11/613003
Inventors:
Jason W. Weigold - Somerville MA, US
Assignee:
Analog Devices, Inc. - Norwood MA
International Classification:
H01L 21/00
US Classification:
438 53, 438 52, 438 50, 257419, 381191, 381174
Abstract:
A method of forming a microphone forms a backplate, and a flexible diaphragm on at least a portion of a wet etch removable sacrificial layer. The method adds a wet etch resistant material, where a portion of the wet etch resistant material is positioned between the diaphragm and the backplate to support the diaphragm. Some of the wet etch resistant material is not positioned between the diaphragm and backplate. The method then removes the sacrificial material before removing any of the wet etch resistant material added during the prior noted act of adding. The wet etch resistant material then is removed substantially in its entirety after removing at least part of the sacrificial material.

Mems Resonator Having An Inner Element And An Outer Element That Flex

US Patent:
7633360, Dec 15, 2009
Filed:
Sep 27, 2006
Appl. No.:
11/535807
Inventors:
Jason W. Weigold - Somerville MA, US
Assignee:
Analog Devices, Inc. - Norwood MA
International Classification:
H03H 9/24
H03H 9/46
H03H 9/50
H03B 5/30
US Classification:
333186, 333199, 331154, 257415
Abstract:
A MEMS resonator has an outer element having an inner surface, the inner surface defining an area and a inner element coupled to the outer element and disposed within the area. The MEMS resonator also has an actuation electrode, in communication with the outer element, for generating electrostatic signals that cause the inner element to flex in a periodic manner.

Integrated Microphone

US Patent:
7795695, Sep 14, 2010
Filed:
Sep 27, 2006
Appl. No.:
11/535804
Inventors:
Jason W. Weigold - Somerville MA, US
John R. Martin - Foxborough MA, US
Timothy J. Brosnihan - Natick MA, US
Assignee:
Analog Devices, Inc. - Norwood MA
International Classification:
H01L 29/84
H04R 25/00
US Classification:
257419, 381175, 181167
Abstract:
A method of forming a microphone having a variable capacitance first deposits high temperature deposition material on a die. The high temperature material ultimately forms structure that contributes to the variable capacitance. The method then forms circuitry on the die after depositing the deposition material. The circuitry is configured to detect the variable capacitance.

Micromachined Microphone And Multisensor And Method For Producing Same

US Patent:
7825484, Nov 2, 2010
Filed:
Apr 25, 2005
Appl. No.:
11/113925
Inventors:
John R. Martin - Foxborough MA, US
Timothy J. Brosnihan - Natick MA, US
Craig Core - North Andover MA, US
Thomas Kieran Nunan - Carlisle MA, US
Jason Weigold - Somerville MA, US
Xin Zhang - Acton MA, US
Assignee:
Analog Devices, Inc. - Norwood MA
International Classification:
H01L 29/82
US Classification:
257415, 257704, 257419, 257680, 257E21235, 257E31032, 381191, 381175, 381355
Abstract:
A micromachined microphone is formed from a silicon or silicon-on-insulator (SOI) wafer. A fixed sensing electrode for the microphone is formed from a top silicon layer of the wafer. Various polysilicon microphone structures are formed above a front side of the top silicon layer by depositing at least one oxide layer, forming the structures, and then removing a portion of the oxide underlying the structures from a back side of the top silicon layer through trenches formed through the top silicon layer. The trenches allow sound waves to reach the diaphragm from the back side of the top silicon layer. In an SOI wafer, a cavity is formed through a bottom silicon layer and an intermediate oxide layer to expose the trenches for both removing the oxide and allowing the sound waves to reach the diaphragm. An inertial sensor may be formed on the same wafer, with various inertial sensor structures formed at substantially the same time and using substantially the same processes as corresponding microphone structures.

Method Of Forming An Integrated Mems Resonator

US Patent:
7863069, Jan 4, 2011
Filed:
Sep 27, 2006
Appl. No.:
11/535698
Inventors:
Jason W. Weigold - Somerville MA, US
Assignee:
Analog Devices, Inc. - Norwood MA
International Classification:
H01L 21/00
US Classification:
438 50, 438 48, 438 53
Abstract:
A method of producing an integrated MEMS resonator includes providing a substrate including single crystal silicon and partially forming a resonator in a first portion of the substrate, the resonator having a resonating element formed by the substrate and an electrode, the resonating element and the electrode forming a variable capacitor. The method also includes forming circuitry in a second portion of the substrate, the circuitry configured for detecting capacitance of the variable capacitor and finish forming the resonator and integrating the resonator with the circuitry so that the electrode is in communication with the circuitry.

Support Apparatus For Microphone Diaphragm

US Patent:
7885423, Feb 8, 2011
Filed:
Jan 22, 2007
Appl. No.:
11/625553
Inventors:
Jason W. Weigold - Somerville MA, US
Assignee:
Analog Devices, Inc. - Norwood MA
International Classification:
H04R 25/00
US Classification:
381174, 381175
Abstract:
A microphone includes a diaphragm assembly supported by a substrate. The diaphragm assembly includes at least one carrier, a diaphragm, and at least one spring coupling the diaphragm to the at least one carrier such that the diaphragm is spaced from the at least one carrier. An insulator (or separate insulators) between the substrate and the at least one carrier electrically isolates the diaphragm and the substrate.

Microphone With Irregular Diaphragm

US Patent:
7961897, Jun 14, 2011
Filed:
Jun 28, 2006
Appl. No.:
11/476378
Inventors:
Jason W. Weigold - Somerville MA, US
Assignee:
Analog Devices, Inc. - Norwood MA
International Classification:
H04R 25/00
US Classification:
381174, 381175, 381369
Abstract:
A microphone is formed to have a diaphragm that is configured to improve signal to noise ratio. To that end, the microphone has a backplate having a hole therethrough, and a diaphragm movably coupled with the backplate. The diaphragm has a bottom surface (facing the backplate) with a convex portion aligned with the hole in the backplate.

Microphone With Pressure Relief

US Patent:
8111871, Feb 7, 2012
Filed:
Jan 17, 2008
Appl. No.:
12/015903
Inventors:
Xin Zhang - Acton MA, US
Michael W. Judy - Ipswich MA, US
Kieran P. Harney - Andover MA, US
Jason W. Weigold - Somerville MA, US
Assignee:
Analog Devices, Inc. - Norwood MA
International Classification:
H04R 11/02
G01L 9/00
US Classification:
381423, 257419
Abstract:
A microphone has a movable diaphragm having a rest position, a stationary portion, and a set of springs movably coupling the diaphragm and the stationary portion. The diaphragm and stationary portion are spaced a first distance when the diaphragm is in the rest position. When not in the rest position, however, the diaphragm and stationary portion are capable of being spaced a second distance, which is greater than the first distance. Despite the change in distance, the diaphragm still is capable of returning the space from the second distance to the first distance when the diaphragm returns to the rest position.

NOTICE: You may not use PeopleBackgroundCheck or the information it provides to make decisions about employment, credit, housing or any other purpose that would require Fair Credit Reporting Act (FCRA) compliance. PeopleBackgroundCheck is not a Consumer Reporting Agency (CRA) as defined by the FCRA and does not provide consumer reports.