Joseph D Olson DeceasedGlenview, IL

2021014, May 13, 2021

Oct 16, 2020

17/072261

- Santa Clara CA, US
Rutger Meyer Timmerman Thijssen - Sunnyvale CA, US
Joseph C. Olson - Beverly MA, US

Applied Materials, Inc. - Santa Clara CA

G02B 5/18
B29D 11/00
G02B 6/02

Methods of producing gratings with trenches having variable height are provided. In one example, a method of forming a diffracted optical element may include providing an optical grating layer over a substrate, patterning a hardmask over the optical grating layer, and forming a sacrificial layer over the hardmask, the sacrificial layer having a non-uniform height measured from a top surface of the optical grating layer. The method may further include etching a plurality of angled trenches into the optical grating layer to form an optical grating, wherein a first depth of a first trench of the plurality of trenches is different than a second depth of a second trench of the plurality of trenches.

2021007, Mar 11, 2021

Nov 19, 2020

16/949890

- Mountain View CA, US
Edgar Chung - Mountain View CA, US
Zhe Yang - Santa Clara CA, US
Ian CA Mesa - Los Gatos CA, US
Joseph Olson - Mountain View CA, US

G06F 16/903
G06F 16/583
G06F 16/58
G06F 16/9535
G06N 5/04

Systems and methods for identification and retrieval of content for visual search are provided. An example method includes receiving data specifying a digital supplement. The data may identify a digital supplement and a supplement anchor for associating the digital supplement with visual content. The method may also include generating a data structure instance that specifies the digital supplement and the supplement anchor and, after generating the data structure instance, enabling triggering of the digital supplement by an image based at least on storing the data structure instance in a database that includes a plurality of other data structure instances. The other data structure instances may each specify a digital supplement and one or more supplement anchors.

2020027, Aug 27, 2020

May 8, 2020

16/870668

- Gloucester MA, US
Rutger Meyer Timmerman Thijssen - Sunnyvale CA, US
Joseph Olson - Beverly MA, US
Peter Kurunczi - Cambridge MA, US

Varian Semiconductor Equipment Associates, Inc. - Gloucester MA

G02B 27/42
G02B 27/01
G02B 5/18

Optical grating components and methods of forming are provided. In some embodiments, a method includes providing an optically transparent substrate, and forming an optical grating layer on the substrate. The method includes forming an optical grating in the optical grating layer, wherein the optical grating comprises a plurality of angled components, disposed at a non-zero angle of inclination with respect to a perpendicular to a plane of the substrate. A first sidewall of the optical grating may have a first angle, and a second sidewall of the grating has a second angle different than the first angle. Modifying process parameters, including selectivity and beam angle spread, has an effect of changing a shape or dimension of the plurality of angled components.

2020023, Jul 23, 2020

Feb 9, 2020

16/785612

- Gloucester MA, US
Rutger Meyer Timmerman Thijssen - Sunnyvale CA, US
Joseph Olson - Beverly MA, US
Peter Kurunczi - Cambridge MA, US
Robert Masci - Atkinson NH, US

Varian Semiconductor Equipment Associates, Inc. - Gloucester MA

G02B 5/18
G11B 7/1372
G11B 7/1353

Embodiments herein provide systems and methods for forming an optical component. A method may include providing a plurality of proximity masks between a plasma source and a workpiece, the workpiece including a plurality of substrates secured thereto. Each of the plurality of substrates may include first and second target areas. The method may further include delivering, from the plasma source, an angled ion beam towards the workpiece, wherein the angled ion beam is then received at one of the plurality of masks. A first proximity mask may include a first set of openings permitting the angled ion beam to pass therethrough to just the first target area of each of the plurality of substrates. A second proximity mask may include a second set of openings permitting the angled ion beam to pass therethrough just to the second target area of each of the plurality of substrates.

2020019, Jun 18, 2020

Dec 13, 2019

16/713744

- Santa Clara CA, US
Visweswaren SIVARAMAKRISHNAN - Cupertino CA, US
Joseph C. OLSON - Beverly MA, US
Ludovic GODET - Sunnyvale CA, US
Rutger MEYER TIMMERMAN THIJSSEN - Sunnyvale CA, US
Naamah ARGAMAN - San Jose CA, US

H02N 13/00

Embodiments of the present disclosure generally relate to substrate support assemblies for retaining a surface of a substrate having one or more devices disposed on the surface without contacting the one or more devices and deforming the substrate, and a system having the same. In one embodiment, the substrate support assembly includes an edge ring coupled to a body of the substrate support assembly. A controller is coupled to actuated mechanisms of a plurality of pixels coupled to the body of the substrate support assembly such that portions of pixels corresponding to a portion of the surface of a substrate to be retained are positioned to support the portion without contacting one or more devices disposed on the surface of the substrate to be retained on the support surface.

2020016, May 28, 2020

Jan 31, 2020

16/778631

- Gloucester MA, US
Rutger Meyer Timmerman Thijssen - Sunnyvale CA, US
Joseph Olson - Beverly MA, US
Peter Kurunczi - Cambridge MA, US
Robert Masci - Atkinson NH, US

Varian Semiconductor Equipment Associates, Inc. - Gloucester MA

G02B 5/18
G11B 7/1353
G11B 7/1372

Embodiments herein provide systems and methods for forming an optical component. A method may include providing a plurality of proximity masks between a plasma source and a workpiece, the workpiece including a plurality of substrates secured thereto. Each of the plurality of substrates may include first and second target areas. The method may further include delivering, from the plasma source, an angled ion beam towards the workpiece, wherein the angled ion beam is then received at one of the plurality of masks. A first proximity mask may include a first set of openings permitting the angled ion beam to pass therethrough to just the first target area of each of the plurality of substrates. A second proximity mask may include a second set of openings permitting the angled ion beam to pass therethrough just to the second target area of each of the plurality of substrates.

2020015, May 21, 2020

Jan 22, 2020

16/749102

- Mountain View CA, US
Edgar Chung - Mountain View CA, US
Zhe Yang - Santa Clara CA, US
Ian Mesa - Los Gatos CA, US
Joseph Olson - Mountain View CA, US

G06F 3/0484
G06T 11/60
G06F 3/0482

Systems and methods for identification and retrieval of content for visual search are provided. An example method includes transmitting a visual-content query to a server computing device and receiving a response to the visual-content query that identifies a digital supplement. The example method also includes causing a user interface to be displayed that includes information associated with the digital supplement. The visual-content query may be based on an image. The digital supplement may include information about the content of the image.

2020009, Mar 26, 2020

Nov 22, 2019

16/691739

- Gloucester MA, US
Huixiong Dai - San Jose CA, US
Anthony Renau - West Newbury MA, US
John Hautala - Beverly MA, US
Joseph Olson - Beverly MA, US

Varian Semiconductor Equipment Associates, Inc. - Gloucester MA

G03F 7/38
G03F 7/20
G03F 7/16
G03F 7/004

A method of patterning a substrate may include providing a blanket photoresist layer on the substrate; performing an ion implantation procedure of an implant species into the blanket photoresist layer, the implant species comprising an enhanced absorption efficiency at a wavelength in the extreme ultraviolet (EUV) range; and subsequent to the performing the ion implantation procedure, performing a patterned exposure to expose the blanket photoresist layer to EUV radiation.