Kenneth Wellman Nill, Age 851633 Valdes Dr, La Jolla, CA 92037

Kenneth Nill Phones & Addresses

16 Bennington Rd, Lexington, MA 02421 (781) 929-5574

10 Bennington Rd, Lexington, MA 02421

24 Bennington Rd, Lexington, MA 02421

1633 Valdes Dr, La Jolla, CA 92037

Burlington, MA

Westborough, MA

Spring, TX

16 Bennington Rd, Lexington, MA 02421

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Mentions for Kenneth Wellman Nill

Publications & IP owners

Us Patents

Large Modal Volume Semiconductor Laser System With Spatial Mode Filter

US Patent:
6804281, Oct 12, 2004
Filed:
Jan 23, 2002
Appl. No.:
10/055872
Inventors:
James N. Walpole - Concord MA, 01742
Kenneth W. Nill - Lexington MA, 02421
International Classification:
H01S 500
US Classification:
372 45, 372 46, 372 98
Abstract:
A semiconductor optical amplification system that uses a single-mode fiber angle-coupled to a semiconductor wave-guide medium with optical gain. This design is particularly simple and relevant to optical fiber systems, but it may be generalized to include other implementations as well, in which other spatial mode filters are employed. A chip design is employed in which lowest order mode has a size greater than about 5 micrometers (m). Thus, much smaller facet angles can be employed while still avoiding self-oscillation. More specifically, according to some aspects of the invention, facet angles of less than 4 to 5 degrees are utilized.

Achromatic Fresnel Optics Based Lithography For Short Wavelength Electromagnetic Radiations

US Patent:
6885503, Apr 26, 2005
Filed:
Nov 5, 2002
Appl. No.:
10/289151
Inventors:
Wenbing Yun - Walnut Creek CA, US
Yuxin Wang - Arlington Heights IL, US
Kenneth W. Nill - Lexington MA, US
Assignee:
Xradia, Inc. - Concord CA
International Classification:
G02B027/44
US Classification:
359565, 359558, 359569, 359351, 359355, 355 53, 355 55
Abstract:
A lithography apparatus having achromatic Fresnel objective (AFO) that combines a Fresnel zone plate and a refractive Fresnel lens. The zone plate provides high resolution for imaging and focusing, while the refractive lens takes advantage of the refraction index change properties of appropriate elements near absorption edges to recombine the electromagnetic radiation of different energies dispersed by the zone plate. This compound lens effectively solves the high chromatic aberration problem of zone plates. The lithography apparatus allows the use of short wavelength radiation in the 1-15 nm spectral range to print high resolution features as small as 20 nm.

Large Modal Volume Semiconductor Laser System With Spatial Mode Filter

US Patent:
7106773, Sep 12, 2006
Filed:
Oct 12, 2004
Appl. No.:
10/963328
Inventors:
James N. Walpole - Concord MA, US
Kenneth W. Nill - Lexington MA, US
International Classification:
H01S 5/00
US Classification:
372 4501, 372 4601
Abstract:
A semiconductor optical amplification system that uses a single-mode fiber angle-coupled to a semiconductor wave-guide medium with optical gain. This design is particularly simple and relevant to optical fiber systems, but it may be generalized to include other implementations as well, in which other spatial mode filters are employed. A chip design is employed in which lowest order mode has a size greater than about 5 micrometers (μm). Thus, much smaller facet angles can be employed while still avoiding self-oscillation. More specifically, according to some aspects of the invention, facet angles of less than 4 to 5 degrees are utilized.

Element-Specific X-Ray Fluorescence Microscope And Method Of Operation

US Patent:
7183547, Feb 27, 2007
Filed:
Nov 23, 2004
Appl. No.:
10/995642
Inventors:
Wenbing Yun - Walnut Creek CA, US
Kenneth W. Nill - Lexington MA, US
Assignee:
Xradia, Inc. - Concord CA
International Classification:
G01N 23/00
G21K 7/00
US Classification:
250310, 378 43, 378 73
Abstract:
An element-specific imaging technique utilizes the element-specific fluorescence X-rays that are induced by primary ionizing radiation. The fluorescence X-rays from an element of interest are then preferentially imaged onto a detector using an optical train. The preferential imaging of the optical train is achieved using a chromatic lens in a suitably configured imaging system. A zone plate is an example of such a chromatic lens; its focal length is inversely proportional to the X-ray wavelength. Enhancement of preferential imaging of a given element in the test sample can be obtained if the zone plate lens itself is made of a compound containing substantially the same element. For example, when imaging copper using the Cu La spectral line, a copper zone plate lens is used. This enhances the preferential imaging of the zone plate lens because its diffraction efficiency (percent of incident energy diffracted into the focus) changes rapidly near an absorption line and can be made to peak at the X-ray fluorescence line of the element from which it is fabricated. In another embodiment, a spectral filter, such as a multilayer optic or crystal, is used in the optical train to achieve preferential imaging in a fluorescence microscope employing either a chromatic or an achromatic lens.

Element-Specific X-Ray Fluorescence Microscope And Method Of Operation

US Patent:
7245696, Jul 17, 2007
Filed:
May 29, 2002
Appl. No.:
10/157089
Inventors:
Wenbing Yun - Walnut Creek CA, US
Kenneth W. Nill - Lexington MA, US
Assignee:
Xradia, Inc. - Concord CA
International Classification:
G01N 23/223
US Classification:
378 45, 378 44
Abstract:
An element-specific imaging technique utilizes the element-specific fluorescence X-rays that are induced by primary ionizing radiation. The fluorescence X-rays from an element of interest are then preferentially imaged onto a detector using an optical train. The preferential imaging of the optical train is achieved using a chromatic lens in a suitably configured imaging system. A zone plate is an example of such a chromatic lens; its focal length is inversely proportional to the X-ray wavelength. Enhancement of preferential imaging of a given element in the test sample can be obtained if the zone plate lens itself is made of a compound containing substantially the same element. For example, when imaging copper using the Cu La spectral line, a copper zone plate lens is used. This enhances the preferential imaging of the zone plate lens because its diffraction efficiency (percent of incident energy diffracted into the focus) changes rapidly near an absorption line and can be made to peak at the X-ray fluorescence line of the element from which it is fabricated. In another embodiment, a spectral filter, such as a multilayer optic or crystal, is used in the optical train to achieve preferential imaging in a fluorescence microscope employing either a chromatic or an achromatic lens.

Cd-Gisaxs System And Method

US Patent:
7920676, Apr 5, 2011
Filed:
Jul 6, 2007
Appl. No.:
11/774183
Inventors:
Wenbing Yun - Walnut Creek CA, US
Yuxin Wang - Northbrook IL, US
Srivatsan Seshadri - Walnut Creek CA, US
Kenneth W. Nill - Lexington MA, US
Assignee:
Xradia, Inc. - Pleasanton CA
International Classification:
G01N 23/20
US Classification:
378 86, 378 70, 378 71
Abstract:
CD-GISAXS achieves reduced measurement times by increasing throughput using longer wavelength radiation (12×, for example) such as x-rays in reflective geometry to increase both the collimation acceptance angle of the incident beams and the scattering signal strength, resulting in a substantial combined throughput gain. This wavelength selection and geometry can result in a dramatic reduction in measurement time. Furthermore, the capabilities of the CD-GISAXS can be extended to meet many of the metrology needs of future generations of semiconductor manufacturing and nanostructure characterization, for example.

Back-End-Of-Line Metallization Inspection And Metrology Microscopy System And Method Using X-Ray Fluorescence

US Patent:
2005028, Dec 22, 2005
Filed:
Jul 8, 2005
Appl. No.:
11/177227
Inventors:
Wenbing Yun - Walnut Creek CA, US
Yuxin Wang - Arlington Heights IL, US
Michael Feser - Walnut Creek CA, US
Kenneth Nill - Lexington MA, US
Assignee:
Xradia, Inc. - Concord CA
International Classification:
G01R031/26
G06F019/00
H01L021/44
H01L021/66
US Classification:
438014000, 438687000, 700121000
Abstract:
Systems and methods for performing inspection and metrology operations on metallization processes such as on back-end-of-line (BEOL) metallization thickness and step coverage are disclosed. Specific examples include measurements of thickness and uniformity of barrier layers, including tantalum for example, and seed layers, including copper for example, in Damascene, including dual-Damascene, trenches during the interconnect fabrication steps of integrated circuit production. The invention also relates to the detection and measurement of void formation during and after copper electroplating. The invention utilizes x-ray fluorescence to measure the absolute thicknesses and the thickness uniformity of the barrier layers in the trenches, the copper seed layers for electroplating, and the final copper interconnects.

Higher Power Semiconductor Radiating Mirror Laser

US Patent:
4196402, Apr 1, 1980
Filed:
Feb 25, 1977
Appl. No.:
5/772325
Inventors:
Jack F. Butler - Lexington MA
Kenneth W. Nill - Lexington MA
Assignee:
Laser Analytics, Inc. - Bedford MA
International Classification:
H01S 318
US Classification:
331 945C
Abstract:
Radiating mirror lasers in which a semiconductor active element containing an appropriately fabricated heterostructure configuration is formed as one end mirror of a two-mirror resonant cavity. The active element is fabricated from an alloy semiconductor compound such a lead salt alloy, the bandgap of which may be varied by varying the relative composition of its constituents. By properly selecting the compound and its composition, lasers may be made for operation at wavelengths that span the ultraviolet, visible and infrared portions of the spectrum. The lasers combine the inherently high power characteristics of a radiating mirror structure with a wide spectral coverage. Arrangements are disclosed for increasing power efficiencies, for tuning the operating wavelength over a wide range and for otherwise improving the utility of the lasers.

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