Mark O Neisser, Age ~6712 Indian Purchase, White House Station, NJ 08889

Mark Neisser Phones & Addresses

12 Indian Purchase, Whitehouse Station, NJ 08889 (908) 534-5264

Albany, NY

Guilderland, NY

302 Kingbird Ct, Three Bridges, NJ 08887

75 Canterbury Ln, East Greenwich, RI 02818 (401) 885-2163

Wappingers Falls, NY

Ithaca, NY

Branchburg, NJ

Hopewell Jct, NY

12 Indian Purchase, Whitehouse Station, NJ 08889 (908) 875-1063

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Mentions for Mark O Neisser

Resumes

Resumes

Mark Neisser Photo 1

Mark Neisser

Location:
United States
Mark Neisser Photo 2

Mark Neisser

Location:
United States

Publications

Us Patents

Process And Apparatus To Adjust Exposure Dose In Lithography Systems

US Patent:
6346979, Feb 12, 2002
Filed:
Mar 17, 1999
Appl. No.:
09/270696
Inventors:
Christopher P. Ausschnitt - Brookfield CT
Scott M. Mansfield - Hopewell Junction NY
Mark O. Neisser - East Greenwich RI
Christopher D. Wait - Beacon NY
Assignee:
International Business Machines Corporation - Armonk NY
International Classification:
G03B 2742
US Classification:
355 53, 355 67, 355 69
Abstract:
A process and apparatus for dynamically adjusting the exposure dose on a photosensitive coating at a localized area within an exposure field in a step-and-scan lithography system. The process and apparatus form a pattern on a photosensitive substrate, such as used in the integrated circuit manufacturing industry. The exposure dose is adjusted at a localized area by a segmented slit system or an array of light-transmitting pixels located across the exposure field. The slit segments or individual pixels are automatically controlled in response to data obtained regarding the uniformity of the projection optics system or the mask pattern.

Underlayer Coating Composition Based On A Crosslinkable Polymer

US Patent:
2009003, Feb 5, 2009
Filed:
Aug 3, 2007
Appl. No.:
11/833361
Inventors:
Hong Zhuang - Raritan NJ,
Huirong Yao - Plainsboro NJ,
Hengpeng Wu - Hillsborough NJ,
Mark Neisser - Whitehouse Station NJ,
Weihong Liu - Bridgewater NJ,
Jianhui Shan - Pennington NJ,
Zhong Xiang - Edison NJ,
International Classification:
G03C 1/00
G03C 5/00
US Classification:
430311, 4302701
Abstract:
The present invention relates to an underlayer coating composition capable of being crosslinked comprising a polymer, a compound capable of generating a strong acid, and optionally a crosslinker, where the polymer comprises at least one absorbing chromophore and at least one moiety selected from an epoxy group, an aliphatic hydroxy group and mixtures thereof.The invention further relates to a process of imaging the underlayer coating compositions.

Positive-Working Photoimageable Bottom Antireflective Coating

US Patent:
8632948, Jan 21, 2014
Filed:
Sep 30, 2009
Appl. No.:
12/570923
Inventors:
Munirathna Padmanaban - Bridgewater NJ,
Srinivasan Chakrapani - Bridgewater NJ,
Francis M. Houlihan - Millington NJ,
Shinji Miyazaki - Fukuroi,
Edward Ng - Belle Mead NJ,
Mark O. Neisser - Whitehouse Station NJ,
Assignee:
AZ Electronic Materials USA Corp. - Somerville NY
International Classification:
G03F 7/039
G03F 7/30
C08F 20/20
US Classification:
4302731, 4302701, 4302711, 4302881, 430326, 430330, 4302851
Abstract:
The invention relates to a photoimageable antireflective coating composition capable of forming a pattern by development in an aqueous alkaline solution, comprising, (i) a polymer A soluble in a coating solvent and comprises a chromophore, a crosslinking moiety, and optionally a cleavable group which under acid or thermal conditions produces a functionality which aids in the solubility of the polymer in an aqueous alkaline solution and; (ii) at least one photoacid generator; (iii) a crosslinking agent; (iv) optionally, a thermal acid generator; (v) a polymer B which is soluble in an aqueous alkaline solution prior to development, where polymer B is non-miscible with polymer A and soluble in the coating solvent, and; (vi) a coating solvent composition, and (vii) optionally, a quencher. The invention also relates to a process for imaging the antireflective coating.

Negative-Working Photoimageable Bottom Antireflective Coating

US Patent:
2003021, Nov 20, 2003
Filed:
Dec 18, 2002
Appl. No.:
10/322239
Inventors:
Joseph Oberlander - Phillipsburg NJ,
Ralph Dammel - Flemington NJ,
Shuji Ding-Lee - Branchburg NJ,
Mark Neisser - Whitehouse Station NJ,
Medhat Toukhy - Flemington NJ,
International Classification:
G03F007/004
G03F007/20
G03F007/038
G03F007/38
US Classification:
430/270100, 430/311000, 430/312000, 430/330000, 430/286100, 430/950000
Abstract:
The present invention relates to novel negative-working, photoimageable, and aqueous developable antireflective coating compositions and their use in image processing by forming a thin layer of the novel antireflective coating composition between a reflective substrate and a photoresist coating. The negative bottom photoimageable antireflective coating composition is capable of being developed in an alkaline developer and is coated below a negative photoresist.

Positive-Working Photoimageable Bottom Antireflective Coating

US Patent:
2005021, Sep 29, 2005
Filed:
Mar 25, 2004
Appl. No.:
10/808884
Inventors:
Yu Sui - Ogasa-gun,
Hengpeng Wu - Hillsborough NJ,
Wenbing Kang - Ogasa-gun,
Mark Neisser - Whitehouse Station NJ,
Tomohide Katayama - Ogasa-gun,
Shuji Ding-Lee - Branchburg NJ,
Aritaka Hishida - Bedminster NJ,
Joseph Oberlander - Phillipsburg NJ,
Medhat Toukhy - Flemington NJ,
International Classification:
G03F007/004
US Classification:
430270100, 430326000
Abstract:
The present invention relates to a positive bottom photoimageable antireflective coating composition which is capable of being developed in an aqueous alkaline developer, wherein the antireflective coating composition comprises a polymer comprising at least one recurring unit with a chromophore group and one recurring unit with a hydroxyl and/or a carboxyl group, a vinyl ether terminated crosslinking agent, and optionally, a photoacid generator and/or an acid and/or a thermal acid generator. The invention further relates to a process for using such a composition.

Negative-Working Photoimageable Bottom Antireflective Coating

US Patent:
2006006, Mar 23, 2006
Filed:
Oct 27, 2005
Appl. No.:
11/260761
Inventors:
Joseph Oberlander - Phillipsburg NJ,
Ralph Dammel - Flemington NJ,
Shuji Ding-Lee - Branchburg NJ,
Mark Neisser - Whitehouse Station NJ,
Medhat Toukhy - Flemington NJ,
International Classification:
G03F 7/004
G03F 7/00
US Classification:
430270100, 430322000
Abstract:
The present invention relates to novel negative-working, photoimageable, and aqueous developable antireflective coating compositions and their use in image processing by forming a thin layer of the novel antireflective coating composition between a reflective substrate and a photoresist coating. The negative bottom photoimageable antireflective coating composition is capable of being developed in an alkaline developer and is coated below a negative photoresist.

Process Of Imaging A Photoresist With Multiple Antireflective Coatings

US Patent:
2006017, Aug 10, 2006
Filed:
Feb 10, 2005
Appl. No.:
11/054723
Inventors:
David Abdallah - Bernardsville NJ,
Mark Neisser - Whitehouse Station NJ,
Ralph Dammel - Flemington NJ,
Georg Pawlowski - Bridgewater NJ,
John Biafore - North Scituate RI,
Andrew Romano - Pittstown NJ,
International Classification:
G03C 5/00
US Classification:
430311000
Abstract:
A process for imaging a photoresist comprising the steps of, a) forming a stack of multiple layers of organic antireflective coatings on a substrate; b) forming a coating of a photoresist over the upper layer of the stack of multiple layers of organic antireflective coatings; c) imagewise exposing the photoresist with an exposure equipment; and, d) developing the coatings with a developer.

Process For Producing An Image Using A First Minimum Bottom Antireflective Coating Composition

US Patent:
2006019, Sep 7, 2006
Filed:
May 2, 2006
Appl. No.:
11/416240
Inventors:
Mark Neisser - Whitehouse Station NJ,
Joseph Oberlander - Phillipsburg NJ,
Medhat Toukhy - Flemington NJ,
Raj Sakamuri - Sharon MA,
Shuji Ding-Lee - Branchburg NJ,
International Classification:
G03F 7/004
US Classification:
430270100
Abstract:
Disclosed is a process for forming an image on a substrate, comprising the steps of: (a) coating on the substrate a first layer of a radiation sensitive, antireflective composition; (b) coating a second layer of a photoresist composition onto the first layer of the antireflective composition; (c) selectively exposing the coated substrate from step (b) to actinic radiation; and (d) developing the exposed coated substrate from step (c) to form an image; wherein both the photoresist composition and the antireflective composition are exposed in step (c); both are developed in step (d) using a single developer; wherein the antireflective composition of step (a) is a first minimum bottom antireflective coating (B.A.R.C.) composition, having a solids content of up to about 8% solids, and a maximum coating thickness of the coated substrate of λ/2n wherein λ is the wavelength of the actinic radiation of step (c) and n is the refractive index of the B.A.R.C. composition.

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