Michael L Bufano, Age 5524 Springfield St, Belmont, MA 02478

7798758, Sep 21, 2010

Nov 7, 2006

11/594365

Michael L. Bufano - Belmont MA, US
Ulysses Gilchrist - Reading MA, US
William Fosnight - Carlisle MA, US
Christopher Hofmeister - Hampstead NH, US
Daniel Babbs - Austin TX, US
Robert C. May - Austin TX, US

Brooks Automation, Inc. - Chelmsford MA

B65H 1/00

41422201, 414266

A semiconductor workpiece processing system having at least one processing apparatus for processing workpieces, a primary transport system, a secondary transport system and one or more interfaces between first transport system and second transport system. The primary and secondary transport systems each have one or more sections of substantially constant velocity and in queue sections communicating with the constant velocity sections.

7806643, Oct 5, 2010

Aug 23, 2005

11/210918

Gerald M. Friedman - New Ipswich NH, US
Michael L. Bufano - Belmont MA, US
Christopher Hofmeister - Hampstead NH, US
Ulysses Gilchrist - Reading MA, US
William Fosnight - Carlisle MA, US

Brooks Automation, Inc. - Chelmsford MA

B65H 1/00
B65G 65/00

41422201, 414277, 414217, 414940

A substrate processing apparatus is provided. The apparatus has a casing, a low port interface and a carrier holding station. The casing has processing devices within for processing substrates. The load port interface is connected to the casing for loading substrates into the processing device. The carrier holding station is connected to the casing. The carrier holding station is adapted for holding at least one substrate transport carrier at the load port interface. The carrier holding station is arranged to provide a fast swap section for replacement of the substrate transport carrier from the carrier holding station.

8267634, Sep 18, 2012

May 11, 2007

11/803077

Michael L. Bufano - Belmont MA, US
Ulysses Gilchrist - Reading MA, US
William Fosnight - Carlisle MA, US
Christopher Hofmeister - Hampstead NH, US
Daniel Babbs - Austin TX, US
Robert C. May - Austin TX, US

Brooks Automation, Inc. - Chelmsford MA

B65G 1/00

4142171, 414940, 104281

A semiconductor workpiece processing system having at least one processing apparatus for processing workpieces, a primary transport system, a secondary transport system and one or more interfaces between first transport system and second transport system. The primary and secondary transport systems each have one or more sections of substantially constant velocity and in queue sections communicating with the constant velocity sections.

8272827, Sep 25, 2012

Aug 13, 2007

11/891835

Michael L. Bufano - Belmont MA, US
Ulysses Gilchrist - Reading MA, US
William Fosnight - Carlisle MA, US
Christopher Hofmeister - Hampstead NH, US
Daniel Babbs - Austin TX, US
Robert C. May - Austin TX, US

B65G 1/00

4142171, 414940

In accordance with an exemplary embodiment a semiconductor workpiece processing system having at least one processing tool for processing semiconductor workpieces, a container for holding at least one semiconductor workpiece therein for transport to and from the at least one processing tool and a first transport section elongated and defining a travel direction. The first transport section has parts, that interface the container, supporting and transporting the container along the travel direction to and from the at least one processing tool. The container is in substantially continuous transport at a substantially constant rate in the travel direction, when supported by the first transport section. A second transport section is connected to the at least one process tool for transporting the container to and from the at least one processing tool.

8293173, Oct 23, 2012

Jul 22, 2010

12/841560

Michael Lawrence Bufano - Belmont MA, US
Steven Raymond Walther - Andover MA, US
Peter F. Hays - Medford MA, US
William Frederick Thomson - Milford NH, US
Arthur Wayne Sommerstein - Marblehead MA, US
Gerald Martin Friedman - New Ipswich MA, US
P. Michael Fletcher - Chelmsford MA, US
Stephen Whittaker Into - Harvard MA, US
Anne Testoni - Bolton MA, US
Brian S. Phillips - Sherborn MA, US

Hitachi Zosen Corporation - Suminoe-Ku

A61L 2/08
B65B 55/08

422 22, 2504923, 2504931, 2504921, 31511181, 31511191

Improved electron beam sterilization apparatus and shielding techniques for use in are provided. A controller modulates an electron beam when sterilizing an interior to an object to ensure that adequate dose is received. Sterilization carousels are configured with input/discharge feeds to reduce the possibility of humans being exposed to dangerous levels of radiation. The system reduces the amount of shielding required to thereby lower cost of installation.

8328495, Dec 11, 2012

Aug 19, 2009

12/544064

Michael L. Bufano - Belmont MA, US
Ulysses Gilchrist - Reading MA, US
William Fosnight - Carlisle MA, US
Christopher Hofmeister - Hampstead NH, US
Daniel Babbs - Austin TX, US
Robert C. May - Austin TX, US

Brooks Automation, Inc. - Chelmsford MA

B65G 1/00

414288, 414935, 414937

A semiconductor workpiece processing system having at least one processing apparatus for processing workpieces, a primary transport system, a secondary transport system and one or more interfaces between first transport system and second transport system. The primary and secondary transport systems each have one or more sections of substantially constant velocity and in queue sections communicating with the constant velocity sections.

8338796, Dec 25, 2012

May 20, 2009

12/469123

Steven Raymond Walther - Andover MA, US
Michael L. Bufano - Belmont MA, US
Gerald M. Friedman - New Ipswich NH, US

Hitachi Zosen Corporation - Suminoe-Ku

G21K 5/00

250423R, 250424, 250427, 315 3957, 31511101, 31511181, 3131075, 313420

An electron beam emitter includes an electron generator for generating electrons. The electron generator can have a housing containing at least one electron source for generating the electrons. The at least one electron source has a width. The electron generator housing can have an electron permeable region spaced from the at least one electron source for allowing extraction of the electrons from the electron generator housing. The electron permeable region can include a series of narrow elongate slots and ribs formed in the electron generator housing and extending laterally beyond the width of the at least one electron source. The electron permeable region can be configured and positioned relative to the at least one electron source for laterally spreading the electrons that are generated by the at least one electron source.

8339024, Dec 25, 2012

Jul 16, 2010

12/837914

Steven R. Walther - Andover MA, US
Gerald M. Friedman - New Ipswich NH, US
Michael L. Bufano - Belmont MA, US

Hitachi Zosen Corporation - Suminoe-Ku

H01J 33/04

313420, 313 46, 3133611, 2504923

An exit window can include an exit window foil, and a support grid contacting and supporting the exit window foil. The support grid can have first and second grids, each having respective first and second grid portions that are positioned in an alignment and thermally isolated from each other. The first and second grid portions can each have a series of apertures that are aligned for allowing the passage of a beam therethrough to reach and pass through the exit window foil. The second grid portion can contact the exit window foil. The first grid portion can mask the second grid portion and the exit window foil from heat caused by the beam striking the first grid portion.