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Nate N NguyenSan Jose, CA

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Related to:
Huong Q Nguyen 63 Halle Hang Nguyen 51 Lan H Nguyen 58 Hung Quoc Nguyen 62 Nathanh N Salfen 50

Nate Nguyen Phones & Addresses

San Jose, CA

Mentions for Nate N Nguyen

Nate Nguyen resumes & CV records

Resumes

Nate Nguyen Photo 38

Supervisor

Location:
Sunnyvale, CA
Industry:
Computer Hardware
Work:
Quanergy
Supervisor Appliedmicro Feb 2014 - Apr 2015
R and D Board Level Test Engineering Bigbyte May 2003 - Feb 2014
Test Engineering Flash Electronics Jul 1999 - May 2003
Test Technician
Education:
San Jose State University 2001 - 2004
Bachelors, Bachelor of Science, Computer Engineering San Jose City College 1999 - 2001
Associates, Communications, Engineering, Electronics
Languages:
English
Vietnamese
Nate Nguyen Photo 39

Aircraft Mechanic

Work:

Aircraft Mechanic

Publications & IP owners

Us Patents

Methods And Apparatus For Cleaning Substrate Surfaces With Atomic Hydrogen

US Patent:
2013016, Jun 27, 2013
Filed:
Dec 21, 2012
Appl. No.:
13/723409
Inventors:
Applied Materials, Inc. - Santa Clara CA, US
JEONGWON PARK - Palo Alto CA, US
PRAVIN K. NARWANKAR - Sunnyvale CA, US
NATE SI NGUYEN - Fountain Valley CA, US
HANH NGUYEN - San Jose CA, US
TO CHAN - Fremont CA, US
JINGJING XU - Cupertino CA, US
Assignee:
APPLIED MATERIALS, INC. - Santa Clara CA
International Classification:
B08B 7/00
H01L 21/02
US Classification:
134 11, 15634533, 15634529, 15634543
Abstract:
Methods and apparatus for cleaning substrate surfaces are provided herein. In some embodiments, a method of cleaning a surface of a substrate may include providing a hydrogen containing gas to a first chamber having a plurality of filaments disposed therein; flowing a current through the plurality of filaments to raise a temperature of the plurality of filaments to a process temperature sufficient to decompose at least some of the hydrogen containing gas; and cleaning the surface of the substrate by exposing the substrate to hydrogen atoms formed from the decomposed hydrogen containing gas for a period of time.

Methods And Apparatus For Cleaning Substrate Surfaces With Atomic Hydrogen

US Patent:
2015031, Oct 29, 2015
Filed:
Jul 7, 2015
Appl. No.:
14/793346
Inventors:
- Santa Clara CA, US
JEONGWON PARK - Palo Alto CA, US
PRAVIN K. NARWANKAR - Sunnyvale CA, US
NATE SI NGUYEN - Fountain Valley CA, US
HANH NGUYEN - San Jose CA, US
TO CHAN - Fremont CA, US
JINGJING XU - Cupertino CA, US
International Classification:
H01L 21/02
B08B 7/00
Abstract:
Methods and apparatus for cleaning substrate surfaces are provided herein. In some embodiments, a method of cleaning a surface of a substrate may include providing a hydrogen containing gas to a first chamber having a plurality of filaments disposed therein; flowing a current through the plurality of filaments to raise a temperature of the plurality of filaments to a process temperature sufficient to decompose at least some of the hydrogen containing gas; and cleaning the surface of the substrate by exposing the substrate to hydrogen atoms formed from the decomposed hydrogen containing gas for a period of time.

Possible Relatives

David H Nguyen  A Nguyen  D D Nguyen  Davina T Nguyen  Davy Nguyen  Deanna K Nguyen  Dam Nguyen  Nate P Johnston  Nate C Steele  Nate N King 

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