Career records & work history
Lawyers & Attorneys
Peng Liu - Lawyer
ISLN:
923626974
Admitted:
2014
Law School:
University Of Texas, J.D., 2014
Peng Yan S Liu, Age 471700 E 56Th St APT 2607, Chicago, IL 60637
Peng Liu Phones & Addresses
1700 E 56Th St APT 2607, Chicago, IL 60637
Albany, CA
135 Rio Robles, San Jose, CA 95134 (408) 383-9972
Fremont, CA
Camarillo, CA
Alameda, CA
Austin, TX
New York, NY
Mentions for Peng Yan S Liu
Publications & IP owners
Us Patents
Quick And Accurate Modeling Of Transmitted Field
US Patent:
7294437, Nov 13, 2007
Filed:
Feb 27, 2004
Appl. No.:
10/789703
Inventors:
Peng Liu - Sunnyvale CA, US
Vivek Singh - Portland OR, US
Vivek Singh - Portland OR, US
Assignee:
Intel Corporation - Santa Clara CA
International Classification:
G03F 1/00
US Classification:
430 5
Abstract:
Systems and techniques to quickly and accurately model a transmitted electromagnetic field through a mask, to design a mask, and to create a library of corrections including edge corrections, edge-to-edge corrections, and corner corrections.
Bootstrapped Circuit
US Patent:
7397284, Jul 8, 2008
Filed:
Apr 3, 2007
Appl. No.:
11/732600
Inventors:
Peng Liu - San Jose CA, US
Assignee:
XILINX, Inc. - San Jose CA
International Classification:
H03K 19/094
H03K 19/0175
H03K 19/082
H03K 19/0175
H03K 19/082
US Classification:
326 88, 326 92, 326 82, 327390
Abstract:
A bootstrapping circuit capable of sampling input signals beyond a supply voltage is disclosed. In one embodiment, the bootstrapped circuit is implemented having a reduced area and/or power consumption requirement.
Initialization Circuit For A Phase-Locked Loop
US Patent:
7504891, Mar 17, 2009
Filed:
May 10, 2007
Appl. No.:
11/801974
Inventors:
Peng Liu - San Jose CA, US
Assignee:
Xilinx, Inc. - San Jose CA
International Classification:
H03L 7/00
US Classification:
331 16, 331 34, 331177 R, 331 1 A, 331185, 327156, 375376
Abstract:
Integrated circuit including a phase-locked loop (PLL) circuit having a first mode and a second mode of operation. Operating the PLL circuit in the first mode may generate a constant frequency responsive to a programmable bias. Operating the PLL circuit in the second mode may generate a frequency tracking a reference signal coupled to an input of the PLL circuit.
Plane Waves To Control Critical Dimension
US Patent:
7517642, Apr 14, 2009
Filed:
Dec 30, 2004
Appl. No.:
11/026257
Inventors:
Peng Liu - Sunnyvale CA, US
Assignee:
Intel Corporation - Santa Clara CA
International Classification:
G03F 7/20
US Classification:
430394, 430 5
Abstract:
The present invention describes an aperture including: an opaque plate; two sliver openings located in the opaque plate, the two sliver openings having rectangular shapes, the two sliver openings being parallel to each other. The present invention further describes a method including: decomposing a pattern into horizontal sub-features and vertical sub-features; forming a first mask corresponding to the horizontal sub-features; forming a second mask corresponding to the vertical sub-features; forming a first aperture with two parallel horizontal sliver openings corresponding to the first mask; forming a second aperture with two parallel vertical sliver openings corresponding to the second mask; exposing a wafer using the first aperture and the first mask; exposing the wafer using the second aperture and the second mask; and exposing the wafer with the third mask.
Mask Design Using Library Of Corrections
US Patent:
7603648, Oct 13, 2009
Filed:
Jun 29, 2005
Appl. No.:
11/174336
Inventors:
Peng Liu - Sunnyvale CA, US
Vivek Singh - Portland OR, US
Bin Hu - Portland OR, US
Vivek Singh - Portland OR, US
Bin Hu - Portland OR, US
Assignee:
Intel Corporation - Santa Clara CA
International Classification:
G06F 17/50
US Classification:
716 21, 716 19, 716 20, 430 5, 430 30, 430394
Abstract:
Systems, techniques, and approaches to quickly generate mask patterns, synthesize near-fields, and design masks. In one aspect, a mask may be designed by modeling the transmitted field using a library of corrections and a fast field model.
Quick And Accurate Modeling Of Transmitted Field
US Patent:
7615319, Nov 10, 2009
Filed:
Oct 3, 2007
Appl. No.:
11/866944
Inventors:
Peng Liu - Sunnyvale CA, US
Vivek Singh - Portland OR, US
Vivek Singh - Portland OR, US
Assignee:
Intel Corporation - Santa Clara CA
International Classification:
G03F 1/00
G06F 17/50
G06F 17/50
US Classification:
430 5, 716 19
Abstract:
Systems and techniques to quickly and accurately model a transmitted electromagnetic field through a mask, to design a mask, and to create a library of corrections including edge corrections, edge-to-edge corrections, and corner corrections.
Three-Dimensional Mask Model For Photolithography Simulation
US Patent:
7703069, Apr 20, 2010
Filed:
Aug 14, 2007
Appl. No.:
11/838582
Inventors:
Peng Liu - Sunnyvale CA, US
Yu Cao - Cupertino CA, US
Jun Ye - Palo Alto CA, US
Yu Cao - Cupertino CA, US
Jun Ye - Palo Alto CA, US
Assignee:
Brion Technologies, Inc. - Santa Clara CA
International Classification:
G06F 17/50
US Classification:
716 19, 716 4, 716 21
Abstract:
A three-dimensional mask model of the invention provides a more realistic approximation of the three-dimensional effects of a photolithography mask with sub-wavelength features than a thin-mask model. In one embodiment, the three-dimensional mask model includes a set of filtering kernels in the spatial domain that are configured to be convolved with thin-mask transmission functions to produce a near-field image. In another embodiment, the three-dimensional mask model includes a set of correction factors in the frequency domain that are configured to be multiplied by the Fourier transform of thin-mask transmission functions to produce a near-field image.
Plane Waves To Control Critical Dimension
US Patent:
7974027, Jul 5, 2011
Filed:
Dec 16, 2008
Appl. No.:
12/316711
Inventors:
Peng Liu - Sunnyvale CA, US
Assignee:
Intel Corporation - Santa Clara CA
International Classification:
G02B 5/00
US Classification:
359894
Abstract:
The present invention describes an aperture including: an opaque plate; two sliver openings located in the opaque plate, the two sliver openings having rectangular shapes, the two sliver openings being parallel to each other. The present invention further describes a method including: decomposing a pattern into horizontal sub-features and vertical sub-features; forming a first mask corresponding to the horizontal sub-features; forming a second mask corresponding to the vertical sub-features; forming a first aperture with two parallel horizontal sliver openings corresponding to the first mask; forming a second aperture with two parallel vertical sliver openings corresponding to the second mask; exposing a wafer using the first aperture and the first mask; exposing the wafer using the second aperture and the second mask; and exposing the wafer with the third mask.
Amazon
Daedalus 143:4 (Fall 2014) - From Atoms To The Stars
Author:
Jerrold Meinwald, Christopher C. Cummins, John Meurig Thomas, Fred Wudl, Chaitan Khosla, K. N. Houk, Peng Liu, Jeremiah P. Ostriker, Anna Frebel, Gáspár Áron Bakos
Publisher:
MIT Press
Binding:
Kindle Edition
Dædalus was founded in 1955 as the Journal of the American Academy of Arts and Sciences. It draws on the enormous intellectual capacity of the American Academy, whose members are among the nation's most prominent thinkers in the arts, sciences, and humanities. The theme for the Fall 2014 issue is "F...
Cyber Situational Awareness: Issues And Research (Advances In Information Security)
Publisher:
Springer
Binding:
Hardcover
Pages:
252
ISBN #:
1441901396
EAN Code:
9781441901392
Motivation for the Book This book seeks to establish the state of the art in the cyber situational awareness area and to set the course for future research. A multidisciplinary group of leading researchers from cyber security, cognitive science, and decision science areas elab orate on the fundament...
Isbn (Books And Publications)
Trusted Recovery And Defensive Information Warfare
Author:
Peng Liu
ISBN #:
0792375726
Data And Applications Security Xx: 20Th Annual Ifip Wg 11.3 Working Conference On Data And Applications Security, Sophia Antipolis, France, July 31-August 2, 2006, Proceedings
Author:
Peng Liu
ISBN #:
3540367969
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