Ralf T Faber, Age 57Boston, MA

Ralf Faber Phones & Addresses

Boston, MA

66 Solomon Pierce Rd, Lexington, MA 02420

425 Woburn St, Lexington, MA 02420

Natick, MA

Social networks

Ralf T Faber

Linkedin

Work

Company: Vacuum process technology llc 2008 to 2013 Position: Ceo

Education

Degree: MBA School / High School: Massachusetts Institute of Technology - Sloan School of Management 2006 to 2007

Industries

Venture Capital & Private Equity

Mentions for Ralf T Faber

Resumes

Resumes

Ralf Faber Photo 1

Vacuum Process Technology, President & Ceo

Position:
CEO at Vacuum Process Technology LLC, Member at Boston Harbor Angels
Location:
Greater Boston Area
Industry:
Venture Capital & Private Equity
Work:
Vacuum Process Technology LLC since 2008
CEO
Boston Harbor Angels since 2003
Member
Education:
Massachusetts Institute of Technology - Sloan School of Management 2006 - 2007
MBA

Publications

Us Patents

Non-Invasive Blood Component Measurement System

US Patent:
2005026, Dec 1, 2005
Filed:
Jan 31, 2005
Appl. No.:
11/048005
Inventors:
Ralf Faber - Lexington MA,
Erik Schwendeman - Charlton MA,
Guangming Wang - Bedford MA,
International Classification:
A61B005/00
US Classification:
600322000, 600310000
Abstract:
Non-invasive, optical apparatus and methods for the direct measurement of hemoglobin derivatives and other analyte concentration levels in blood using diffuse reflection and transmission spectroscopy in the wavelength region 400-1350 nm which includes the transparent tissue window from approximately 610 to 1311 nanometers and, using diffuse reflection spectroscopy, the mid-infrared region from 4.3-12 microns in wavelength. Large area light collection techniques are utilized to provide a much larger pulsate signal than can be obtain with current sensor technology. Sensors used in separate or simultaneous precision measurements of both diffuse reflection and transmission, either separately or simultaneously, from pulsate, blood-perfused tissue for the subsequent determination of the blood analytes concentrations such as arterial blood oxygen saturation (SaO), carboxyhemoglobin (COHb), oxyhemoglobin (OHb), deoxyhemoglobin (dOHb), methemoglobin (metHb), water (H2O), hematocrit (HCT), glucose, cholesterol and proteins such as albumin and other analytes components.

Vapor Deposition Source

US Patent:
2012024, Sep 27, 2012
Filed:
Mar 22, 2012
Appl. No.:
13/427323
Inventors:
Ralf T. Faber - Lexington MA,
Ronald A. Crocker - Hanover MA,
Keqi Zhang - Wayland MA,
Joseph Patrinostro - Centerville MA,
James S. Snyder - Suffield MA,
Assignee:
VACUUM PROCESS TECHNOLOGY LLC - Plymouth MA
International Classification:
C23C 16/448
US Classification:
4272555, 118726
Abstract:
A vapor deposition source for vaporizing a material has a body forming an interior chamber, at least one crucible in the interior chamber, and a divider that divides the interior chamber into a transport channel and a distribution channel. To deposit vapor on an underlying substrate, the deposition source also has a plurality of exit orifices formed in the body adjacent to the distribution channel. The divider has a set of divider apertures between the transport channel and the distribution channel. This divider aperture is positioned generally symmetrically within the interior chamber.

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