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Saeed Reza Bagheri, Age 44306 Ridge Rd, Watchung, NJ 07069

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Known as:
Saeed R Bagheri Saeed Reza Nagher Saeed Bagherl

Saeed Bagheri Phones & Addresses

Watchung, NJ

Ossining, NY

168 Grand St, Croton on Hudson, NY 10520

Malden, MA

Boulder, CO

Cambridge, MA

Somerset, NJ

131 Hunter Ln, Ossining, NY 10562

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Mentions for Saeed Reza Bagheri

Career records & work history

Medicine Doctors

Saeed Bagheri

Specialties:
Gastroenterology
Work:
Riverside Medical Clinic
7117 Brockton Ave FL 3, Riverside, CA 92506
(951) 683-6370 (phone) (951) 784-3272 (fax)
Site
Education:
Medical School
Shiraz Univ of Med Sci & Hlth Serv, Med Sch, Shiraz, Iran
Graduated: 1969
Procedures:
Colonoscopy, Upper Gastrointestinal Endoscopy, Vaccine Administration
Conditions:
Cirrhosis, Gastroesophageal Reflux Disease (GERD), Gastrointestinal Hemorrhage, Hemorrhoids, Irritable Bowel Syndrome (IBS), Acute Pancreatitis, Anemia, Atrial Fibrillation and Atrial Flutter, Benign Polyps of the Colon, Celiac Disease, Cholelethiasis or Cholecystitis, Constipation, Disorders of Lipoid Metabolism, Diverticulitis, Diverticulosis, Esophagitis, Gastritis and Duodenitis, Hypertension (HTN), Infectious Liver Disease, Inflammatory Bowel Disease (IBD), Iron Deficiency Anemia, Overweight and Obesity, Peptic Ulcer Disease, Raynaud's Disease, Vitamin D Deficiency
Languages:
Arabic, Chinese, English, Korean, Spanish
Description:
Dr. Bagheri graduated from the Shiraz Univ of Med Sci & Hlth Serv, Med Sch, Shiraz, Iran in 1969. He works in Riverside, CA and specializes in Gastroenterology. Dr. Bagheri is affiliated with Parkview Community Hospital Medical Center and Riverside Community Hospital.

Saeed Bagheri resumes & CV records

Resumes

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Saeed Bagheri

Publications & IP owners

Us Patents

Dynamic Provisional Decomposition Of Lithographic Patterns Having Different Interaction Ranges

US Patent:
8266554, Sep 11, 2012
Filed:
Aug 5, 2011
Appl. No.:
13/204440
Inventors:
Saeed Bagheri - Croton on Hudson NY, US
Francisco Barahona - White Plains NY, US
Laszlo Ladanyi - Peekskill NY, US
Jonathan Lee - Yorktown Heights NY, US
David O. Melville - New York NY, US
Alan E. Rosenbluth - Yorktown Heights NY, US
Daniele P. Scarpazza - Dobbs Ferry NY, US
Marc A. Szeto-Millstone - Seattle WA, US
Kehan Tian - Poughkeepsie NY, US
Andreas Waechter - New York NY, US
Assignee:
International Business Machines Corporation - Armonk NY
International Classification:
G06F 17/50
US Classification:
716 51, 716 50, 716 52, 716 53, 716 54, 716 55
Abstract:
A method for obtaining mask and source patterns for printing integrated circuit patterns includes providing initial representations of a plurality of mask and source patterns. The method identifies long-range and short-range factors in the representations of the plurality of mask and source patterns, and provides a plurality of clips including a specified number of mask patterns. Short-range factors having overlapping ranges for each of the clips are specified. The method includes determining an initial processing priority for the plurality of clips, and determining a patterning relationship between integrated circuit patterns and the mask and source patterns. A primary objective is determined which expresses the printability of the integrated circuit patterns in terms of the patterning relationship. The method defines and iteratively solves a master problem employing the primary objective to generate values for the long-range factors, and solves subproblems employing a second objective for generating values for the short-range factors.

Method To Match Exposure Tools Using A Programmable Illuminator

US Patent:
8351037, Jan 8, 2013
Filed:
Jul 12, 2010
Appl. No.:
12/834379
Inventors:
Jaione Tirapu Azpiroz - Poughkeepsie NY, US
Saeed Bagheri - Croton on Hudson NY, US
Kafai Lai - Poughkeepsie NY, US
David O. Melville - New York NY, US
Alan E. Rosenbluth - Yorktown Heights NY, US
Kehan Tian - Poughkeepsie NY, US
Assignee:
International Business Machines Corporation - Armonk NY
International Classification:
G01B 11/00
US Classification:
356401, 356 73
Abstract:
Programmable illuminators in exposure tools are employed to increase the degree of freedom in tool matching. A tool matching methodology is provided that utilizes the fine adjustment of the individual source pixel intensity based on a linear programming (LP) problem subjected to user-specific constraints to minimize the difference of the lithographic wafer data between two tools. The lithographic data can be critical dimension differences from multiple targets and multiple process conditions. This LP problem can be modified to include a binary variable for matching sources using multi-scan exposure. The method can be applied to scenarios that the reference tool is a physical tool or a virtual ideal tool. In addition, this method can match different lithography systems, each including a tool and a mask.

Multi-Mode Multiplexing Using Staged Coupling And Quasi-Phase-Matching

US Patent:
8363987, Jan 29, 2013
Filed:
Sep 2, 2009
Appl. No.:
12/552387
Inventors:
Saeed Bagheri - Yorktown Heights NY, US
Wiliam M. Green - Yorktown Heights NY, US
Petar Pepeljugoski - Yorktown Heights NY, US
Yurii A. Vlasov - Yorktown Heights NY, US
Assignee:
International Business Machines Corporation - Armonk NY
International Classification:
G02F 1/035
US Classification:
385 3
Abstract:
A mode-selective add/drop unit for a mode division de/multiplexing device includes an optical ADU waveguide adapted for coupling to an input optical waveguide. The optical ADU waveguide includes at least one region providing optical signal coupling between the ADU waveguide and a multi-mode waveguide; and, one or more phase matching regions for controlling a relative or absolute phase difference between an electromagnetic wave (EMW) carried in the ADU waveguide and the multi-mode waveguide. The mode-selective add/drop unit may further include a transition region connecting the coupling region and a phase matching region, wherein a shape of a transition region is governed by a polynomial function, exponential function, logarithmic function, trigonometric function or, any combination of these functions.

Scheduling Resources From A Multi-Skill Multi-Level Human Resource Pool

US Patent:
8407073, Mar 26, 2013
Filed:
Aug 25, 2010
Appl. No.:
12/868027
Inventors:
Saeed Bagheri - Croton on Hudson NY, US
Jarir K. Chaar - Tarrytown NY, US
Yi-Min Chee - Yorktown Heights NY, US
Daniel V. Oppenheim - Croton on Hudson NY, US
Krishna C. Ratakonda - Yorktown Heights NY, US
Nianjun Zhou - Danbury CT, US
Assignee:
International Business Machines Corporation - Armonk NY
International Classification:
G06Q 10/00
US Classification:
705 713, 705 711, 705 712, 705 714
Abstract:
Each work item from a group of work items is categorized as either complex or intense, and a unique work requirement statement is derived for each work item based on whether it is complex or intense. A unique resource value statement is assigned to different human resources. Past performances of the human resources are analyzed against completed work items in order to adjust the unique resource value statement, thus creating updated human resource value statements. An optimized work requirement statement is created by recalculating the unique work requirement statement for each work item based on the updated human resource value statements. A schedule for automated allocation of human resources to functional areas of an enterprise activity environment and scheduling of work items to the functional areas is formulated based on the optimized requirement statement for each work item in the group of work items.

Tool For Manager Assistance

US Patent:
8417554, Apr 9, 2013
Filed:
May 6, 2011
Appl. No.:
13/102203
Inventors:
Shivali Agarwal - Ghaziabad, IN
Saeed Bagheri - Croton On Hudson NY, US
Jarir K. Chaar - Tarrytown NY, US
Ali Parandehgheibi - Medford MA, US
Krishna C. Ratakonda - Yorktown Heights NY, US
Bikram Sengupta - Bangalore, IN
Assignee:
International Business Machines Corporation - Armonk NY
International Classification:
G06Q 10/00
US Classification:
705 714, 705 711, 705 715, 705 713, 705 742
Abstract:
A computer implemented method, system, and/or computer program product generate an optimal training policy and an optimal promotion policy to accommodate an upcoming project. Required new job positions are identified for an upcoming project. A skillset matrix, which describes a current skill level of each worker in a work unit, and a promotion matrix, which describes historical evaluations of how well each worker achieved predefined goals of past projects, are generated. The skillset matrix is utilized to create an optimal training policy that identifies which workers are in need of additional training in order to qualify for one or more of the identified new job positions, and the promotion matrix is utilized create an optimal promotion policy that identifies which workers will be candidates for being promoted into one or more of the identified said new job positions.

Collaboration Based Capacity Planning In A Modular Business Setting

US Patent:
8417555, Apr 9, 2013
Filed:
May 18, 2010
Appl. No.:
12/782312
Inventors:
Saeed Bagheri - Croton On Hudson NY, US
Jarir K. Chaar - Tarrytown NY, US
Krishna C. Ratakonda - Yorktown Heights NY, US
Nianjun Zhou - Danbury CT, US
Assignee:
International Business Machines Corporation - Armonk NY
International Classification:
G06Q 10/00
US Classification:
705 722, 705 714, 705 715, 705 723, 705 725
Abstract:
A computer implemented method, system, and/or computer program product collaboratively reallocate resources across business modules. A collaboration vector, which describes primary and second abilities for each of multiple resources, is defined. A decision matrix is created from multiple collaboration vectors, and a pipeline for transferring the multiple resources among multiple business modules is defined based on the decision matrix. A recurring time interval to measure an effectiveness of the multiple business modules is defined, and the multiple resources are reallocated according to a measured effectiveness of the multiple business modules. The collaborative matrix is optimized to reflect reallocation of the multiple resources.

Wavefront Engineering Of Mask Data For Semiconductor Device Design

US Patent:
8453076, May 28, 2013
Filed:
Mar 16, 2010
Appl. No.:
12/725287
Inventors:
Tadanobu Inoue - Kanagawa-ken, JP
David O. Melville - Yorktown Heights NY, US
Hidemasa Muta - Kanagawa, JP
Alan E. Rosenbluth - Yorktown Heights NY, US
Kehan Tian - Hopewell Junction NY, US
Masaharu Sakamoto - Kanagawa-ken, JP
Saeed Bagheri - Yorktown Heights NY, US
Assignee:
International Business Machines Corporation - Armonk NY
International Classification:
G06F 17/50
US Classification:
716 53
Abstract:
Optical wave data for a semiconductor device design is divided into regions. First wavefront engineering is performed on the wave data of each region, accounting for just the wave data of each region and not accounting for the wave data of neighboring regions of each region. The optical wave data of each region is normalized based on results of the first wavefront engineering. Second wavefront engineering is performed on the wave data of each region, based at least on the wave data of each region as has been normalized. The second wavefront engineering takes into account the wave data of each region and a guard band around each region that includes the wave data of the neighboring regions of each region. The second wavefront engineering can be sequentially performed by organizing the regions into groups, and sequentially performing the second wavefront engineering on the regions of each group in parallel.

Automated Allocation Of Resources To Functional Areas Of An Enterprise Activity Environment

US Patent:
8463637, Jun 11, 2013
Filed:
Aug 25, 2010
Appl. No.:
12/868049
Inventors:
Saeed Bagheri - Croton on Hudson NY, US
Jarir K. Chaar - Tarrytown NY, US
Yi-Min Chee - Yorktown Heights NY, US
Krishna C. Ratakonda - Yorktown Heights NY, US
Nianjun Zhou - Danbury CT, US
Assignee:
International Business Machines Corporation - Armonk NY
International Classification:
G06Q 10/00
US Classification:
705 714
Abstract:
A computer implemented method, system and/or computer program product automatically allocate resources to functional areas of an enterprise activity environment. A skill level of a resource is determined for multiple functional areas. A unique ramp-up index is associated with each of the multiple functional areas. An affinity index is associated with each of the multiple functional areas, wherein the affinity index is based on a level of productivity drop of other resources in a specific functional area if the resource is assigned to another functional area. Expected resource and skill level requirements of a project are identified, and a cohesion index is defined. The cohesion index measures the disruption that may result from adding the resource to or removing the resource from a functional area. The resource is automatically allocated to one or more functional areas based on the unique ramp-up index, the cohesion index, and the affinity index associated with a particular functional area in view of the expected resource and skill level requirements.

Possible Relatives

Fatemeh Z Bagheri  Mohammad S Bagheri  Nader M Bagheri  Reza T Bagheri  Shiva G Bagheri  Babak Bagheri  Bob Bagheri  Saeed A Khan  Saeed A Mirza  Saeed A Osman 

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