Ted A Loxley Deceased236 Tom Corwin Rd, Wellston, OH 45692

6355587, Mar 12, 2002

Aug 18, 1997

08/914288

Ted A. Loxley - Willoughby OH, 44094
John F. Blackmer - Willoughby OH, 44094
Klaus-Markus Peters - Willoughby OH, 44094

C03B 2000

501 54, 501 56, 65111, 65 173, 65 176, 65 22, 65 301, 65 321, 65DIG 8, 264653, 264654, 264660, 264666, 264674, 264681

The application discloses a number of unique sintered quartz glass products together with new silica compositions and processes for making and using such products. Nitrided clear and opaque nitrided quartz products are disclosed having incredible physical properties resulting from the incorporation of very small, but effective, amounts (e. g. , 25 ppm or more) of chemically bound nitrogen. Opaque quartz glass heat shields with remarkable resistance to transmission of infrared radiation are disclosed which can have a high bubble population density, such as 80 to 120 per mm. These heat shields make possible remarkable improvement in the performance of tube furnaces and other reactors used in processing silicon wafers and other electronic components.

6381986, May 7, 2002

Jan 11, 2000

09/481208

Ted A. Loxley - Willoughby OH, 44094
John F. Blackmer - Willoughby OH, 44094
Klaus-Markus Peters - Willoughby OH, 44094

C03B 1906

65 175, 65 301, 65 321, 65 331, 65111

A number of unique processes are disclosed for manufacture of sintered high-purity quartz glass products in which a shaped silica body or preform is made from an aqueous slurry of micronized silica particles by gel casting, slip casting or electrophoretic deposition. The silica particles may comprise a major portion by weight of crystalline silica. In one embodiment of the invention the sintered quartz glass is transparent, substantially bubble-free and suitable for scientific or optical uses. In another embodiment the porous silica preform is fired in steam to increase the hydroxyl content and then nitrided in a nitrogen-hydrogen reducing atmosphere. A minute amount of chemically-combined nitrogen in the high-purity quartz glass is sufficient to provide a tremendous improvement in physical properties and an incredible increase in the resistance to devitrification.

7111476, Sep 26, 2006

May 7, 2002

10/139940

Ted A Loxley - Wellston OH, US
John F. Blackmer - Mentor-on-the-Lake OH, US
Klaus-Markus Peters - Mentor OH, US

C03B 8/02
C03B 19/02

65 172, 65 173

Cup-shaped porous silica preforms suitable for manufacture of large 24-inch crucibles used in Czochralski crystal-growing furnaces are produced by a unique electrophoretic casting process using a high-purity aqueous silica slip or slurry having a predetermined particle-size distribution, an average particle size of from 6 to 10 microns and a solids content of from 80 to 85 percent by weight. The slurry contains an electrolyte, such as ammonium hydroxide, has a pH of from 7. 5 to 8. 5, and can be wet milled at a pH of at least 7 in such manner as to provide the micronized silica particles with excellent electrophoretic mobility, thereby providing a superb process for economical mass production of large pure silica preforms using safe voltages, such as 20 to 40 volts. The electrophoretic casting apparatus can be of the type shown in FIGS. and and includes a permeable porous cup-shaped carbon-graphite mold () that serves as a positive anode and an internal reticulate or perforated cathode () of similar shape having a thin pervious cover means, such as the shroud , to prevent local dilution of the slurry at the cathode.

7410814, Aug 12, 2008

Oct 19, 2005

11/254248

Ted A. Loxley - Wellston OH, US
Vincent A. Greene - Cleveland OH, US

H01L 21/31

438 4, 438690, 438746, 134 12, 134 13, 257E21483

An effective electropurge process and apparatus for wet processing of semiconductor wafers applies electrical charges to the wafer surface with an ample voltage sufficient to provide an effective field intensity which can substantially eliminate intolerable sub-0. 05 micron “killer” defects when making highly advanced microchips with a feature size or line width less than 0. 15 micron. The process can be used with frequent voltage reversal for automated wet-batch cleaning operations using cassettes that hold 10 to 50 wafers at a time and in various other operations involving megasonic transducers, mechanical brush scrubbers, laser cleaners and CMP equipment. The electropurge process is primarily intended for Fab plants where large wafers with a diameter of 200 to 400 mm require 250 to 350 steps including many dry layering, patterning and doping operations and at least 30 wet processing steps.

7674695, Mar 9, 2010

Oct 25, 2004

10/972717

Ted A. Loxley - Wellston OH, US

H01L 21/04

438510, 438689, 438692, 438693, 438906, 257E21043, 134 13

An electromegasonic wafer cleaning system is disclosed that is extremely important, if not essential, in the fabrication of advanced microelectronic devices having a line width or feature size of from 0. 05 to 0. 10 micron. A unique synergistic combination is provided wherein piezoelectric transducer means are operated at a tolerable power level, such as from 1 to 2 watts per square centimeter, to minimize the risk of harm to the extremely delicate microcircuits and wherein the face of each wafer is negatively charged to a temperate voltage, such as from 5 to 20 volts, sufficient to cause effective removal of colloidal or sub 0. 4-micron contaminant particles. This unique wafer cleaning system supersedes and replaces the standard megasonic-assisted RCA-type wet wafer cleaning systems which have never been able to eliminate or provide efficient purging of harmful sub 0. 1-micron particles.

5053359, Oct 1, 1991

May 16, 1990

7/523982

Ted A. Loxley - Mentor OH
Harold L. Wheaton - Minerva OH

Pyromatics, Inc. - Willoughby OH

C03C 1014
C03B 3700

501 4

A high-density silica glass article with excellent thermal shock characteristics is formed from a high purity vitreous silica containing an aluminum compound as a crystallization aid and having a dense concentration of cristobalite muclei. The aluminum compound is aluminum oxide, aluminum hydroxide, an aluminum salt, or other aluminum-oxide precursor. A refractory silica glass crucible made according to the invention has remarkable advantages in a Czochralski crystal-growing process. The entire crucible can be crystallized during the initial melt down in the Cz furnace to provide a cristobalite inner surface which effectively resists attack by the molten silicon to minimize contamination problems during crystal growing. Another embodiment of the invention relates to a unique drawn silica glass with good flexural strength having fibrous oriented veins of cristobalite embedded in a matrix of vitreous silica and having remarkable resistance to deformation at temperatures of 1500. degree. C. and higher as are encountered in certain ferrous casting and investment casting processes.

3972704, Aug 3, 1976

Aug 5, 1974

5/495129

Ted A. Loxley - Mentor OH
Walter G. Barber - North Perry OH
Walter W. Combs - Mentor OH
John M. Webb - Chagrin Falls OH

Sherwood Refractories, Inc. - East Cleveland OH

C03B 2900

65157

Apparatus is disclosed for automated mass production of precision transparent silica glass products in accordance with a unique process in which slip-cast fused silica articles are rapidly heated and sintered in a vacuum or in a helium or hydrogen atmosphere at high temperatures, such as 2950. degree. to 3150. degree. F. A heated graphite susceptor shaped to conform to the outer surface of the fused silica article is automatically moved between a cooling zone and an induction furnace chamber which is opened momentarily to admit the article. The furnace and the graphite susceptor are designed to cause the trapped gases in the article to move radially outwardly and to effect rapid heating so as to avoid substantial devitrification during sintering.

4093017, Jun 6, 1978

Dec 29, 1975

5/644939

John J. Miller - South Euclid OH
Donald L. Eppink - Mentor OH
Ted A. Loxley - Mentor OH

Sherwood Refractories, Inc. - Cleveland OH

B22C 102
B22C 904
B22C 910
B22C 912

164 28

A porous high-silica core is disclosed for use in directional solidification casting processes having exceptional thermal stability at temperatures above 1650. degree. C. and containing mineralizers which promote the formation of cristobalite. The cores may be made by mixing at least 75 parts of essentially pure fused silica particles with 1 to 25 parts of activating particles containing a mineralizer, such as an alkali metal or alkaline earth metal compound, may be fired at a temperature of 1000. degree. to 1300. degree. C. until they contain 35 percent or more of cristobalite and may then be cooled to room temperature. They may thereafter be incorporated in a shell mold in accordance with the "lost-wax" process and preheated with the shell mold at a temperature of 1300. degree. to 1600. degree. C. to provide a cristobalite content of 60 to 85 percent or more within a short period of time, such as 10 to 30 minutes, and before a molten superalloy is allowed to flow into the mold. The core has exceptionally high thermal stability and may be maintained at a temperature of 1550. degree. to 1600. degree. C.