Travis Thomas Tesch, Age 5213627 E Columbine Dr, Scottsdale, AZ 85259

2010030, Dec 2, 2010

May 17, 2010

12/781353

Joseph Yudovsky - Campbell CA, US
Jeffrey Tobin - Mountain View CA, US
Patricia M. Liu - Saratoga CA, US
Faruk Gungor - San Jose CA, US
Tai T. Ngo - Dublin CA, US
Travis Tesch - Santa Clara CA, US
Kenric Choi - Santa Clara CA, US

APPLIED MATERIALS, INC. - Santa Clara CA

G01N 7/00

702 50, 73 3104

Methods of determining an amount of precursor in an ampoule have been provided herein. In some embodiments, a method for determining an amount of solid precursor in an ampoule may include determining a first pressure in an ampoule having a first volume partially filled with a solid precursor; flowing an amount of a first gas into the ampoule to establish a second pressure in the ampoule; determining a remaining portion of the first volume based on a relationship between the first pressure, the second pressure, and the amount of the first gas flowed into the ampoule; and determining the amount of solid precursor in the ampoule based on the first volume and the remaining portion of the first volume.

2020029, Sep 17, 2020

Jun 2, 2017

16/306189

- Santa Clara CA, US
David ISHIKAWA - Mountain View CA, US
Travis TESCH - Santa Clara CA, US

F16K 3/02
B08B 5/02
F16K 51/02
H01L 21/67
G05D 16/20

Embodiments of gate valves and methods for using same are provided herein. In some embodiments, a gate valve for processing a continuous substrate includes: a body; a plurality of seals disposed within the body and configured to move between a closed position and an open position; a plurality of volumes disposed between adjacent ones of the plurality of seals and defined by the plurality of seals and the body; a gas inlet disposed through a first side of the body and fluidly coupled to an innermost one of the plurality of volumes; and a gas outlet disposed through a second side of the body opposite the first side and fluidly coupled to other ones of the plurality of volumes disposed on either side of the innermost one of the plurality of volumes.

2020002, Jan 23, 2020

Jul 16, 2019

16/512699

- Santa Clara CA, US
Travis Tesch - Campbell CA, US

C23C 14/54
C23C 14/56
G01B 11/30

Described herein are apparatus and methods used to process a substrate in a chamber, in particular to position a non-round substrate in a holding chamber or a processing chamber. Further described herein are a 3D mapping device that is configured to measure the surface profile of a non-round substrate and a position of the substrate on the robot arm.

2020002, Jan 23, 2020

Jul 16, 2019

16/512705

- Santa Clara CA, US
Travis Tesch - Campbell CA, US

G03F 1/22
H01L 21/67
H01L 21/673
H01L 21/68
G03F 7/20

Described herein are apparatus and methods used to process a substrate in a chamber, in particular to position a non-round substrate in a holding chamber or a processing chamber. Further described herein are methods and apparatus that detect radiation transmitted along the thickness of the substrate between the top surface and the bottom surface, determine a signal strength as the substrate is rotated and obtaining a signal strength pattern to determine a position of the substrate within the chamber with respect to a center position.