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William H Meisburger, Age 95670 Carriage Ln, Jacksonville, OR 97530

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Known as:
William E Meisburger William S Meisburger Bill E Meisburger William E N Ponseti Wm H Meisburger William E Thornton William R
Related to:
Gwendolyn I Vanhuss

William Meisburger Phones & Addresses

Jacksonville, OR

San Francisco, CA

San Jose, CA

119 Buena Ventura Ct, Solana Beach, CA 92075

12261 Carmel Vista Rd, San Diego, CA 92130

Work

Company: Mo' chowder house - Cannon Beach, OR Mar 2013 Position: Prep/line cook, dishwasher

Education

School / High School: Rogue Valley Community College- Medford, OR May 2006 Specialities: G.E.D.

Skills

Computers - Expert • Customer Service - Expert • Spanish - Advanced

Mentions for William H Meisburger

William Meisburger resumes & CV records

Resumes

William Meisburger Photo 6

William Meisburger - Medford, OR

Work:
Mo' Chowder House - Cannon Beach, OR Mar 2013 to Dec 2013
Prep/Line Cook, Dishwasher El Riconcito - Seaside, OR May 2011 to Dec 2012
General Manager KFC/Taco Bell - Seaside, OR May 2010 to Apr 2011
Assistant Manager Dundee's bar and grill - Seaside, OR Apr 2008 to Apr 2010
Waiter/Delivery driver Burger King - Hillsboro, OR May 2007 to Oct 2007
Team Member McDonalds - Medford, OR Aug 2006 to Apr 2007
Cook Taco Bell - Medford, OR Apr 2005 to May 2006
Shift Manager Abby's Legendary Pizza - Medford, OR Feb 2004 to Dec 2004
Cook
Education:
Rogue Valley Community College - Medford, OR May 2006
G.E.D.
Skills:
Computers - Expert, Customer Service - Expert, Spanish - Advanced

Publications & IP owners

Us Patents

Continuous Direct-Write Optical Lithography

US Patent:
7167296, Jan 23, 2007
Filed:
Aug 21, 2003
Appl. No.:
10/646525
Inventors:
William Daniel Meisburger - San Jose CA, US
Assignee:
Maskless Lithography, Inc. - San Jose CA
International Classification:
G02B 26/00
G03B 27/42
G03B 27/54
G03B 27/72
US Classification:
359290, 359291, 359292, 355 53, 355 67, 355 71
Abstract:
An optical lithography system comprises a light source, a spatial light modulator, imaging optics and means for continuously moving a photosensitive substrate relative to the spatial light modulator. The spatial light modulator comprises at least one array of individually switchable elements. The spatial light modulator is continuously illuminated and an image of the spatial light modulator is continuously projected on the substrate; consequently, the image is constantly moving across the surface of the substrate. While the image is moving across the surface, elements of the spatial light modulator are switched such that a pixel on the surface of the substrate receives, in serial, doses of energy from multiple elements of the spatial light modulator, thus forming a latent image on the substrate surface. The imaging optics is configured to project a blurred image of the spatial light modulator on the substrate, enabling sub-pixel resolution feature edge placement.

Continuous Direct-Write Optical Lithography

US Patent:
7295362, Nov 13, 2007
Filed:
Sep 14, 2004
Appl. No.:
10/941969
Inventors:
William Daniel Meisburger - San Jose CA, US
Assignee:
Maskless Lithography, Inc. - San Jose CA
International Classification:
G02B 26/00
G02B 26/08
G02F 1/29
G03B 27/72
G03B 27/70
US Classification:
359290, 359291, 359298, 355 35, 355 67
Abstract:
An optical lithography system comprises a light source, a spatial light modulator, imaging optics and means for continuously moving a photosensitive substrate relative to the spatial light modulator. The spatial light modulator comprises at least one array of individually switchable elements. The spatial light modulator is continuously illuminated and an image of the spatial light modulator is continuously projected on the substrate; consequently, the image is constantly moving across the surface of the substrate. While the image is moving across the surface, elements of the spatial light modulator are switched such that a pixel on the surface of the substrate receives, in serial, doses of energy from multiple elements of the spatial light modulator, thus forming a latent image on the substrate surface. The imaging optics is configured to project a blurred image of the spatial light modulator on the substrate, enabling sub-pixel resolution feature edge placement.

Gray Level Method For Slim-Based Optical Lithography

US Patent:
7508570, Mar 24, 2009
Filed:
Oct 24, 2007
Appl. No.:
11/923390
Inventors:
William Daniel Meisburger - San Jose CA, US
Assignee:
Maskless Lithography, Inc. - San Jose CA
International Classification:
G02B 26/00
G02B 26/08
G02F 1/29
G03B 27/72
G03B 27/70
US Classification:
359290, 359291, 359298, 355 35, 355 67
Abstract:
An optical lithography system comprises a light source, a spatial light modulator, imaging optics and means for continuously moving a photosensitive substrate relative to the spatial light modulator. The spatial light modulator comprises at least one array of individually switchable elements. The spatial light modulator is continuously illuminated and an image of the spatial light modulator is continuously projected on the substrate; consequently, the image is constantly moving across the surface of the substrate. While the image is moving across the surface, elements of the spatial light modulator are switched such that a pixel on the surface of the substrate receives, in serial, doses of energy from multiple elements of the spatial light modulator, thus forming a latent image on the substrate surface. The imaging optics is configured to project a blurred image of the spatial light modulator on the substrate, enabling sub-pixel resolution feature edge placement.

Apparatus For Slm-Based Optical Lithography With Gray Level Capability

US Patent:
7639416, Dec 29, 2009
Filed:
Oct 24, 2007
Appl. No.:
11/923399
Inventors:
William Daniel Meisburger - San Jose CA, US
Assignee:
Maskless Lithography, Inc. - San Jose CA
International Classification:
G02B 26/00
G02B 26/08
G02F 1/29
G03B 27/72
G03B 27/70
US Classification:
359290, 359291, 359298, 355 35, 355 67
Abstract:
An optical lithography system comprises a light source, a spatial light modulator, imaging optics and means for continuously moving a photosensitive substrate relative to the spatial light modulator. The spatial light modulator comprises at least one array of individually switchable elements. The spatial light modulator is continuously illuminated and an image of the spatial light modulator is continuously projected on the substrate; consequently, the image is constantly moving across the surface of the substrate. While the image is moving across the surface, elements of the spatial light modulator are switched such that a pixel on the surface of the substrate receives, in serial, doses of energy from multiple elements of the spatial light modulator, thus forming a latent image on the substrate surface. The imaging optics is configured to project a blurred image of the spatial light modulator on the substrate, enabling sub-pixel resolution feature edge placement.

Method Of Operation For Slm-Based Optical Lithography Tool

US Patent:
7719753, May 18, 2010
Filed:
Oct 24, 2007
Appl. No.:
11/923364
Inventors:
William Daniel Meisburger - San Jose CA, US
Assignee:
Maskless Lithography, Inc. - San Jose CA
International Classification:
G02B 26/00
G02B 26/08
G02F 1/29
G03B 27/72
G03B 27/70
US Classification:
359290, 359291, 359298, 355 35, 355 67
Abstract:
An optical lithography system comprises a light source, a spatial light modulator, imaging optics and means for continuously moving a photosensitive substrate relative to the spatial light modulator. The spatial light modulator comprises at least one array of individually switchable elements. The spatial light modulator is continuously illuminated and an image of the spatial light modulator is continuously projected on the substrate; consequently, the image is constantly moving across the surface of the substrate. While the image is moving across the surface, elements of the spatial light modulator are switched such that a pixel on the surface of the substrate receives, in serial, doses of energy from multiple elements of the spatial light modulator, thus forming a latent image on the substrate surface. The imaging optics is configured to project a blurred image of the spatial light modulator on the substrate, enabling sub-pixel resolution feature edge placement.

Method For Opens/Shorts Testing Of Capacitively Coupled Networks In Substrates Using Electron Beams

US Patent:
5057773, Oct 15, 1991
Filed:
Jun 1, 1990
Appl. No.:
7/522007
Inventors:
Steven D. Golladay - Hopewell Junction NY
Fritz J. Hohn - Somers NY
David J. Hutson - Apalachin NY
William D. Meisburger - San Jose CA
Juergen Rasch - Wappingers Falls NY
Assignee:
International Business Machines Corporation - Armonk NY
International Classification:
G01R 3128
G01R 3102
US Classification:
324158R
Abstract:
An E-beam testing system uses the E-beam to test a sample with conductive elements thereon. The system charges conductive elements on the sample. Above the sample and parallel to its upper surface is a stacked pair of parallel extraction grids. One grid is biased positively to accelerate secondary electrons emitted from the sample. The other grid is biased at a voltage to control the angular distribution of secondary electrons passing through the grid. Rectangular double grid sets, tilted with respect to the beam and the sample, are located above and laterally of the sample and the E-beam. Those grids are charged to attract secondary electrons from the sample. Triangular grids between the rectangular grids and a top grid above and parallel to the sample with an aperture therethrough for the E-beam are biased negatively to repel secondary electrons. Below the rectangular and triangular grids is located a cylindrical attraction grid biased positively, coaxial with the E-beam. A method of testing electrical connections and short circuits of conductors on a body of insulating material without physical contact includes the steps of: a) applying an unfocused flood electron beam with a low current to a broad surface of the body, simultaneously applying a different focused probe electron beam having an energy predetermined to provide a charge of opposite polarity from the flood beam to other areas of the body to be probed, b) generating an electron beam to cause secondary electron emission from the conductors; and c) detecting the presence of connections not at a given potential.

Electron Lens

US Patent:
4330708, May 18, 1982
Filed:
Apr 28, 1980
Appl. No.:
6/144596
Inventors:
William D. Meisburger - Los Altos CA
International Classification:
G21K 108
H01J 2946
US Classification:
250396ML
Abstract:
An electron lens having very low spherical aberration. The two electrodes of the lens, in the case of an immersion lens, and the outer electrodes in the case of a three electrode lens, have central openings (in the region of the optical axis) covered by a metallic thin foil or a fine mesh metallic screen curved in the general shape of a hyperbola. Equations and procedures are given for determining the exact shape of the curvature. A procedure is also disclosed for forming the metallic foil or screen section of the electrode to the desired shape.

Imaging Apparatus Having A Plurality Of Movable Beam Columns, And Method Of Inspecting A Plurality Of Regions Of A Substrate Intended To Be Substantially Identical

US Patent:
2016006, Mar 3, 2016
Filed:
Jun 30, 2015
Appl. No.:
14/755389
Inventors:
- Minneapolis MN, US
Lawrence P. Muray - Moraga CA, US
James P. Spallas - San Ramon CA, US
William Daniel Meisburger - San Jose CA, US
International Classification:
H01J 37/29
H01J 37/22
H01J 37/063
H01J 37/20
Abstract:
An apparatus for inspecting a substrate is described. The apparatus includes an X-Y stage that supports a substrate to be inspected and is operable to move a substrate supported thereby in X and Y directions; and an imaging system including a plurality of beam columns operable to irradiate regions of a substrate supported by the X-Y stage with beams of energy, respectively, discrete from one another. Respective ones of the beam columns are movable relative to others of the electron beam columns.

Possible Relatives

William R Stamps  William J Stanaland  William J Stancil  William R Standifer  William W Standiford  William J Standish  William R White  William L Jolly  William M Stank  William T Stankiewicz 

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