Inventors:
Jeffrey Rzepiela - Sunnyvale CA, US
Yiping Feng - Cupertino CA, US
Shiyou Pei - Saratoga CA, US
Alexander Kagan - San Jose CA, US
Jianou Shi - Milpitas CA, US
Sergio Edelstein - Los Gatos CA, US
Assignee:
KLA-TENCOR TECHNOLOGIES CORP. - Milpitas CA
International Classification:
G01R 31/26
Abstract:
Systems and methods for controlling deposition of a charge on a wafer for measurement of one or more electrical properties of the wafer are provided. One system includes a corona source configured to deposit the charge on the wafer and a sensor configured to measure one or more conditions within the corona source. This system also includes a control subsystem configured to alter one or more parameters of the corona source based on the one or more conditions. Another system includes a corona source configured to deposit the charge on the wafer and a mixture of gases disposed within a discharge chamber of the corona source during the deposition of the charge. The mixture of gases alters one or more parameters of the charge deposited on the wafer.